SCHEMBL5697601

SCHEMBL5697601

O=C1CCCC(OC(=O)c2cccc3ccccc23)C1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.43
MEN1 O00255 2/20 0.43
NPC1 O15118 1/20 0.43
RAB9A P51151 1/20 0.43
GAA P10253 2/20 0.42
POLB P06746 1/20 0.42
LGALS9 O00182 1/20 0.41
LGALS8 O00214 1/20 0.41
LGALS1 P09382 1/20 0.41
LGALS3 P17931 1/20 0.41
LGALS7; LGALS7B P47929 1/20 0.41
NR4A1 P22736 1/20 0.41
NR4A2 P43354 1/20 0.41
NR4A3 Q92570 1/20 0.41
KDM4E B2RXH2 1/20 0.40
ALDH1A1 P00352 1/20 0.40
BCHE P06276 1/20 0.40
MMP1 P03956 1/20 0.38
MMP2 P08253 1/20 0.38
MMP9 P14780 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2117154 0.84 KMT2A (0.53) KMT2AMEN1NPC1RAB9AGAA
SCHEMBL27499333 0.84 KMT2A (0.53) KMT2AMEN1NPC1RAB9AGAA
SCHEMBL2119946 0.83 KMT2A (0.56) KMT2AMEN1NPC1RAB9AGAA
SCHEMBL27479917 0.82 KMT2A (0.54) KMT2AMEN1NPC1RAB9AGAA
SCHEMBL9542149 0.81 KMT2A (0.55) KMT2AMEN1NPC1RAB9AGAA
SCHEMBL5697632 0.79 L3MBTL1 (0.47) KMT2AMEN1KDM4EALDH1A1
SCHEMBL28558095 0.78 MEN1 (0.39) KMT2AMEN1NPC1RAB9APOLB
SCHEMBL4151620 0.77 CHRNA7 (0.51) KMT2AMEN1GAAPOLB
SCHEMBL5697660 0.76 SLC6A4 (0.42) KMT2AMEN1NPC1RAB9ALGALS9
SCHEMBL7590749 0.75 POLB (0.55) KMT2AMEN1GAAPOLBNR4A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1441256-B1 Radiation-sensitive resin composition JSR CORP (JP) 2006-05-31 EP disclosed
EP-0789278-B1 Radiation-sensitive resin composition JSR CORP (JP) 2005-05-04 EP disclosed
EP-1441256-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2004-07-28 EP disclosed
US-6727032-B1 USEFUL IN MICRO-PROCESSING USING VARIOUS RADIATIONS, E.G., FAR-ULTRAVIOLET RADIATION SUCH AS KRF EXCIMER LASER OR ARF EXCIMER LASER, X RAYS SUCH AS SYNCHROTRON RADIATION, CHARGED PARTICLE RADIATION SUCH AS ELECTRON BEAM, ETC. JSR CORPORATION (JP) 2004-04-27 US disclosed
US-6692887-B1 COPOLYMER OF SUCH AS MALEIC ANHYDRIDE AND NORBORNENE ACID CLEAVABLE DERIVATIVE; TRANSPARENCY; DRY ETCHING RESISTANCE; PHOTORESIST PATTERN WITH HIGH ADHESION, SENSITIVITY, RESOLUTION AND DEVELOPABILITY JSR CORPORATION (JP) 2004-02-17 US disclosed
EP-0789278-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-08-13 EP disclosed