SCHEMBL5698765

SCHEMBL5698765

CC1CCCN1.[Al]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL75738 0.97
SCHEMBL489083 0.97
SCHEMBL31225133 0.97
SCHEMBL75737 0.97
Potassium SCHEMBL31266896 0.93
Hydrochloric Acid SCHEMBL238775 0.93
SCHEMBL31266879 0.93
Hydrochloric Acid SCHEMBL902194 0.93
Hydrochloric Acid SCHEMBL238776 0.93
Bromide SCHEMBL489645 0.93

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0952156-B1 Aluminium complex derivatives for chemical vacuum evaporation and the method of producing the same ROHM & HAAS (US) 2006-08-02 EP disclosed
US-6399772-B1 VAPOR DEPOSITION ROHM AND HAAS COMPANY 2002-06-04 US disclosed
US-6143357-A Aluminum complex derivatives for chemical vacuum evaporation and the method of producing the same ROHM AND HAAS COMPANY (US) 2000-11-07 US disclosed
EP-0952156-A2 Aluminium complex derivatives for chemical vacuum evaporation and the method of producing the same ROHM AND HAAS COMPANY (US) 1999-10-27 EP disclosed