Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL5700772

CC[n+]1cc[nH]c1C.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.36

Full drug profile on Sugi Atlas →

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
KCNH2 Q12809 9/20 0.36
ACHE P22303 8/20 0.35
KDM4E B2RXH2 2/20 0.33
MAPT P10636 2/20 0.33
HSD17B10 Q99714 1/20 0.32
GPR3 P46089 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL30034978 1.00 KCNH2 (0.36) KCNH2ACHEKDM4EMAPTHSD17B10
SCHEMBL21173943 0.88
Trifluoromethanesulfonic Acid SCHEMBL5950265 0.87 KCNH2 (0.38) KCNH2ACHE
Sulfuric Acid SCHEMBL28470571 0.86
SCHEMBL5700786 0.85 CA1 (0.30)
Trifluoromethanesulfonic Acid SCHEMBL2396296 0.84 KCNH2 (0.42) KCNH2ACHEKDM4E
Trifluoromethanesulfonic Acid SCHEMBL8012760 0.84 ACHE (0.36) KCNH2ACHE
SCHEMBL12483680 0.84
SCHEMBL22832295 0.83 KDM4E (0.30) KDM4EMAPT
Trifluoromethanesulfonic Acid SCHEMBL1768672 0.82 KCNH2 (0.46) KCNH2ACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1086506-A1 PRIMARY OR SECONDARY ELECTROCHEMICAL GENERATOR ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL) (CH) 2001-03-28 EP claimed
WO-1999059218-A1 PRIMARY OR SECONDARY ELECTROCHEMICAL GENERATOR ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL) SRI (CH) 1999-11-18 WO claimed
CN-115717051-B Silicone adhesive protective film and optical element comprising same 三星SDI株式会社 2024-07-30 CN disclosed
US-20240230711-A1 GAS SENSOR, SCANNING ELECTROCHEMICAL GAS MICROSCOPE, AND METHOD OF PREPARING GAS SENSOR UIF (UNIVERSITY INDUSTRY FOUNDATION), YONSEI UNIVERSITY (KR) 2024-07-11 US disclosed
US-20230194460-A1 GAS SENSOR, SCANNING ELECTROCHEMICAL GAS MICROSCOPE, AND METHOD OF PREPARING GAS SENSOR INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) 2023-06-22 US disclosed
CN-113728252-B Silicone adhesive protective film and optical element comprising same 三星SDI株式会社 2023-05-16 CN disclosed
CN-115717051-A Silicone adhesive protective film and optical element comprising same 三星SDI株式会社 2023-02-28 CN disclosed
EP-3762447-A1 METHOD FOR PRODUCING FIBRES, FILMS AND MOULDED BODIES OF A POLYBENZAZOLE POLYMER (P) BASF SE (DE) 2021-01-13 EP disclosed
WO-2019170529-A1 METHOD FOR PRODUCING FIBRES, FILMS AND MOULDED BODIES OF A POLYBENZAZOLE POLYMER (P) BASF SE (DE) 2019-09-12 WO disclosed
EP-2864128-A1 A STATIC DISSIPATING LASER ENGRAVABLE FILM 3M Innovative Properties Company (US) 2015-04-29 EP disclosed
WO-2013191762-A1 A STATIC DISSIPATING LASER ENGRAVABLE FILM 3M INNOVATIVE PROPERTIES COMPANY (US) 2013-12-27 WO disclosed
WO-2003011958-A1 OPTICALLY CLEAR AND ANTISTATIC PRESSURE SENSITIVE ADHESIVES 3M INNOVATIVE PROPERTIES COMPANY (US) 2003-02-13 WO disclosed
WO-2002075826-A2 MESOPOROUS NETWORK ELECTRODE FOR ELECTROCHEMICAL CELL XOLIOX SA (CH) 2002-09-26 WO disclosed
EP-1242670-A1 WATER- AND OIL-REPELLENT, ANTISTATIC COMPOSITION 3M Innovative Properties Company (US) 2002-09-25 EP disclosed
EP-1244168-A1 Mesoporous network electrode for electrochemical cell Francois Sugnaux (CH) 2002-09-25 EP disclosed
EP-1232206-A1 ANTISTATIC COMPOSITION 3M Innovative Properties Company (US) 2002-08-21 EP disclosed
WO-2001049925-A1 WATER- AND OIL-REPELLENT, ANTISTATIC COMPOSITION 3M INNOVATIVE PROPERTIES COMPANY (US) 2001-07-12 WO disclosed
WO-2001025326-A1 ANTISTATIC COMPOSITION 3M INNOVATIVE PROPERTIES COMPANY (US) 2001-04-12 WO disclosed
EP-1086506-A1 PRIMARY OR SECONDARY ELECTROCHEMICAL GENERATOR ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL) (CH) 2001-03-28 EP disclosed
WO-1999059218-A1 PRIMARY OR SECONDARY ELECTROCHEMICAL GENERATOR ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL) SRI (CH) 1999-11-18 WO disclosed