SCHEMBL5702014

SCHEMBL5702014

CCCc1ccc(OC(=O)OC(C)(C)C)cc1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 3/20 0.60
THRB P10828 4/20 0.57
PLA2G1B P04054 1/20 0.49
KMT2A Q03164 1/20 0.49
ATG4B Q9Y4P1 1/20 0.49
ALDH1A1 P00352 2/20 0.48
MAPT P10636 2/20 0.46
NPC1 O15118 1/20 0.46
CASP3 P42574 1/20 0.46
RAB9A P51151 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
SENP8 Q96LD8 1/20 0.46
SENP7 Q9BQF6 1/20 0.46
SENP6 Q9GZR1 1/20 0.46
MAPKAPK2 P49137 1/20 0.45
KDM1A O60341 1/20 0.45
THRA P10827 1/20 0.43
ACACB O00763 1/20 0.42
ACACA Q13085 1/20 0.42
PLK1 P53350 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13845227 0.93 ELANE (0.74) ELANETHRBPLA2G1BKMT2AATG4B
SCHEMBL4065386 0.91 ELANE (0.51) ELANETHRBPLA2G1BKMT2AATG4B
SCHEMBL4055926 0.91 ELANE (0.59) ELANETHRBPLA2G1BKMT2AATG4B
SCHEMBL4055000 0.91 ELANE (0.59) ELANETHRBPLA2G1BKMT2AATG4B
SCHEMBL13845209 0.90 ELANE (0.50) ELANETHRBPLA2G1BKMT2AATG4B
SCHEMBL16726556 0.89 THRB (0.60) ELANETHRBKMT2AALDH1A1MAPT
SCHEMBL4057131 0.89 ELANE (0.49) ELANETHRBPLA2G1BKMT2AATG4B
SCHEMBL30520595 0.87 ELANE (0.60) ELANETHRBSMN1; SMN2MAPKAPK2KDM1A
SCHEMBL1788209 0.86 ELANE (0.64) ELANETHRBKMT2AALDH1A1NPC1
SCHEMBL234883 0.86 THRB (0.68) ELANETHRBPLA2G1BKMT2AATG4B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105301905-B Chemically amplified positive resist composition and patterning method 信越化学工业株式会社 2020-11-20 CN disclosed
EP-2657766-B1 Patterning process SHINETSU CHEMICAL CO (JP) 2018-02-28 EP disclosed
EP-1693707-A1 Positive resist composition, and patterning process using the same Shinetsu Chemical Co., Ltd. (JP) 2006-08-23 EP disclosed
EP-1059563-B1 Agent for reducing substrate dependence of resist WAKO PURE CHEM IND LTD (JP) 2006-08-09 EP disclosed
EP-0875787-B1 Method for reducing the substrate dependence of resist WAKO PURE CHEM IND LTD (JP) 2005-12-14 EP disclosed
EP-1113005-B1 Sulfonium salt compounds WAKO PURE CHEM IND LTD (JP) 2003-08-06 EP disclosed
EP-1238969-A2 Sulfonium salt compounds Wako Pure Chemical Industries, Ltd. (JP) 2002-09-11 EP disclosed
EP-1113005-A1 Sulfonium salt compounds Wako Pure Chemical Industries, Ltd. (JP) 2001-07-04 EP disclosed
EP-1059563-A1 Agent for reducing substrate dependence of resist Wako Pure Chemical Industries, Ltd. (JP) 2000-12-13 EP disclosed