SCHEMBL5705672

SCHEMBL5705672

COC(NC(OC)c1ccccc1)c1ccccc1

nearest known ligand 0.45

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.45
ALDH1A1 P00352 2/20 0.38
EPHX1 P07099 1/20 0.38
THRB P10828 1/20 0.38
TSHR P16473 1/20 0.37
CYP2D6 P10635 1/20 0.37
SRC P12931 1/20 0.37
GAA P10253 1/20 0.37
HTR2A P28223 1/20 0.37
HRH1 P35367 1/20 0.37
SIGMAR1 Q99720 1/20 0.36
MEN1 O00255 1/20 0.36
MAPT P10636 1/20 0.36
MAPK1 P28482 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
ATM Q13315 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
DPP4 P27487 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15422792 0.83 KMT2A (0.43) KMT2AALDH1A1EPHX1THRBTSHR
SCHEMBL701331 0.81 KMT2A (0.42) KMT2AALDH1A1EPHX1THRBTSHR
SCHEMBL10431640 0.80 TAAR1 (0.42) HTR2AHRH1MAPK1
Hydrochloric Acid SCHEMBL13724468 0.79 AOC3 (0.41) KMT2AALDH1A1TSHRSMN1; SMN2DPP4
SCHEMBL10336179 0.76 MME (0.46) KMT2ATHRBTSHRMAPTSMN1; SMN2
SCHEMBL5727862 0.76 KMT2A (0.42) KMT2AALDH1A1EPHX1THRBTSHR
SCHEMBL14675504 0.76 KMT2A (0.52) KMT2AALDH1A1TSHRGAAL3MBTL1
SCHEMBL21243279 0.75 HTT (0.42) KMT2ATSHRCYP2D6HTR2AHRH1
SCHEMBL8704293 0.74 KMT2A (0.50) KMT2AALDH1A1TSHRSRC
SCHEMBL15514630 0.74 KMT2A (0.50) KMT2AALDH1A1TSHRCYP2D6GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0400657-B1 Process for developing of ps plates requiring no dampening water FUJI PHOTO FILM CO LTD (JP) 1996-03-27 EP claimed
US-5290665-A Process for developing PS plate requiring no dampening water wherein the developer comprises, water, a solubilizer and an ethylene glycol mono(alkyl C6 -C8) ether derivative FUJI PHOTO FILM CO., LTD. (JP) 1994-03-01 US claimed
US-5252431-A Light sensitive layer and silicone rubber layer; spraying pressurized liquid on the surface to remove the rubber layer FUJI PHOTO FILM CO., LTD. (JP) 1993-10-12 US claimed
US-5230989-A Presensitized plate FUJI PHOTO FILM CO., LTD. (JP) 1993-07-27 US claimed
EP-0336400-A2 Developer for dry ps plates FUJI PHOTO FILM CO., LTD. (JP) 1989-10-11 EP claimed
US-20190248958-A1 PREPARATION METHOD OF OLIGOMER ADDITIVE, OLIGOMER ADDITIVE, AND LITHIUM BATTERY NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY (TW) 2019-08-15 US disclosed
EP-1338434-B1 Directly imageable waterless planographic printing plate precursor TORAY INDUSTRIES (JP) 2006-09-06 EP disclosed
US-6964841-B2 Multilayer; heat insulation layer, heat sensitive elements, ink repellent; offset printing; applying voltage to pin electrode TORAY INDUSTRIES, INC. (JP) 2005-11-15 US disclosed
US-20030175619-A1 Multilayer; heat insulation layer, heat sensitive elements, ink repellent; offset printing; applying voltage to pin electrode TORAY INDUSTRIES, INC. (JP) 2003-09-18 US disclosed
EP-1338434-A2 Directly imageable waterless planographic printing plate precursor TORAY INDUSTRIES, INC. (JP) 2003-08-27 EP disclosed
US-6284433-B1 IMAGEWISELY IRRADIATING PRECURSOR OF PRINTING PLATE WITH LASER BEAM, PRE-TREATING PRECURSOR WITH GLYCOL COMPOUND AND/OR A GLYCOL ETHER COMPOUND; REMOVING INK REPELLENT LAYER WHEREIN HEAT SENSITIVE LAYER IS PARTIALLY LEFT ON PRINTING PLATE TORAY INDUSTRIES, INC. (JP) 2001-09-04 US disclosed
EP-0400657-B1 Process for developing of ps plates requiring no dampening water FUJI PHOTO FILM CO LTD (JP) 1996-03-27 EP disclosed
US-5230989-A Presensitized plate FUJI PHOTO FILM CO., LTD. (JP) 1993-07-27 US disclosed
EP-0475384-A1 Spray development process Fuji Photo Film Co., Ltd. (JP) 1992-03-18 EP disclosed
EP-0100938-B1 TREATMENT OF IMAGE-FORMING LAMINATED PLATE TORAY INDUSTRIES, INC. (JP) 1990-06-13 EP disclosed
EP-0154980-B1 NEGATIVE WORKING LIGHT-SENSITIVE LITHOGRAPHIC PLATE REQUIRING NO DAMPENING SOLUTION AND PLATE MAKING PROCESS FUJI PHOTO FILM CO., LTD. (JP) 1990-05-30 EP disclosed
US-4642283-A USING A BASIC COMPOUND IN THE DEVELOPER TO EFFECT COUPLING OF AN O-QUINONEDIAZIDE COMPOUND IN THE NONEXPOSED AREA FUJI PHOTO FILM CO., LTD. (JP) 1987-02-10 US disclosed
EP-0154980-A1 Negative working light-sensitive lithographic plate requiring no dampening solution and plate making process FUJI PHOTO FILM CO., LTD. (JP) 1985-09-18 EP disclosed
US-4496647-A Treatment of image-forming laminated plate TORAY INDUSTRIES, INC. (JP) 1985-01-29 US disclosed
EP-0100938-A2 Treatment of image-forming laminated plate TORAY INDUSTRIES, INC. (JP) 1984-02-22 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20190248958-A1 PREPARATION METHOD OF OLIGOMER ADDITIVE, OLIGOMER ADDITIVE, AND LITHIUM BATTERY PCNA, SCO2, PARG KMT2A 2205/4885ALDH1A1 3550/4885EPHX1 3398/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.