SCHEMBL5709686

SCHEMBL5709686

Cc1ccc(S(=O)(=O)Oc2ccc(OS(=O)(=O)c3ccc(C)cc3)c(S(=O)(=O)O[I+](c3ccc(C(C)(C)C)cc3)c3ccc(C(C)(C)C)cc3)c2)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.43
HSD17B3 P37058 1/20 0.43
MEN1 O00255 2/20 0.43
KMT2A Q03164 2/20 0.43
ALDH1A1 P00352 2/20 0.43
MAPT P10636 2/20 0.43
RECQL P46063 1/20 0.43
ENPP1 P22413 5/20 0.40
ENPP3 O14638 4/20 0.40
ENPP2 Q13822 1/20 0.40
CYP1A2 P05177 1/20 0.39
NR1I2 O75469 5/20 0.39
PTPN1 P18031 1/20 0.39
HPGD P15428 1/20 0.38
HTT P42858 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
KDM4E B2RXH2 1/20 0.36
KDM4A O75164 1/20 0.36
GFER P55789 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5709660 0.88 MEN1 (0.51) HSD11B1HSD17B3MEN1KMT2AALDH1A1
SCHEMBL6742786 0.86 MEN1 (0.50) HSD11B1HSD17B3MEN1KMT2AALDH1A1
SCHEMBL5709680 0.83 HSD11B1 (0.47) HSD11B1HSD17B3MEN1KMT2AALDH1A1
SCHEMBL7113861 0.83 GFER (0.47) HSD11B1HSD17B3MEN1KMT2AALDH1A1
SCHEMBL6741623 0.83 CYP1A2 (0.43) HSD11B1HSD17B3MEN1KMT2AALDH1A1
SCHEMBL51291 0.83 TSHR (0.47) HSD11B1HSD17B3MEN1KMT2AALDH1A1
SCHEMBL6741515 0.82 HSD11B1 (0.47) HSD11B1HSD17B3MEN1KMT2AALDH1A1
SCHEMBL7512481 0.81 HSD11B1 (0.40) HSD11B1HSD17B3MEN1KMT2AALDH1A1
SCHEMBL2990067 0.78 MEN1 (0.62) HSD11B1HSD17B3MEN1KMT2AALDH1A1
SCHEMBL6742252 0.77 TDP1 (0.48) HSD11B1HSD17B3MEN1KMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1077391-B1 Onium salts, photoacid generators for resist compositions, and patterning process SHINETSU CHEMICAL CO (JP) 2006-09-27 EP disclosed
US-6440634-B1 MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS SHIN-ETSU CHEMICAL CO., LTD (JP) 2002-08-27 US disclosed
EP-1077391-A1 Onium salts, photoacid generators for resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-02-21 EP disclosed