Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSK | P43235 | 5/20 | 0.56 |
| ▸ | CTSS | P25774 | 2/20 | 0.56 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.46 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.43 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.43 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.43 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.43 |
| ▸ | REN | P00797 | 2/20 | 0.42 |
| ▸ | AAK1 | Q2M2I8 | 2/20 | 0.42 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | CTSL | P07711 | 2/20 | 0.39 |
| ▸ | CTSB | P07858 | 2/20 | 0.39 |
| ▸ | CTSH | P09668 | 1/20 | 0.39 |
| ▸ | CACNA1B | Q00975 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
| ▸ | CA7 | P43166 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL55961 | 1.00 | CTSK (0.56) | CTSKCTSSCYP3A4HDAC4HDAC1 | |
| SCHEMBL1424703 | 1.00 | CTSK (0.56) | CTSKCTSSCYP3A4HDAC4HDAC1 | |
| SCHEMBL3613717 | 0.98 | CTSK (0.54) | CTSKCTSSCYP3A4HDAC4HDAC1 | |
| SCHEMBL3613715 | 0.98 | CTSK (0.54) | CTSKCTSSCYP3A4HDAC4HDAC1 | |
| SCHEMBL24298236 | 0.95 | CTSK (0.51) | CTSKCTSSCYP3A4HDAC4HDAC1 | |
| SCHEMBL1155264 | 0.95 | CTSK (0.51) | CTSKCTSSCYP3A4HDAC4HDAC1 | |
| SCHEMBL13087476 | 0.92 | CTSK (0.53) | CTSKCTSSCYP3A4HDAC4HDAC1 | |
| SCHEMBL14923517 | 0.92 | CTSK (0.53) | CTSKCTSSCYP3A4HDAC4HDAC1 | |
| SCHEMBL14151833 | 0.92 | CTSK (0.53) | CTSKCTSSCYP3A4HDAC4HDAC1 | |
| SCHEMBL8269725 | 0.88 | CTSK (0.56) | CTSKCTSSCYP3A4HDAC4HDAC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 149 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6132499-A | Inks | XEROX CORPORATION (US) | 2000-10-17 | — | — | US | claimed |
| US-6110265-A | Ink compositions | XEROX CORPORATION (US) | 2000-08-29 | — | — | US | claimed |
| US-6106601-A | MIXTURE CONTAINING OXAZOLINE AND THIOUREA COMPOUNDS | XEROX CORPORATION (US) | 2000-08-22 | — | — | US | claimed |
| US-6071333-A | Ink compositions | XEROX CORPORATION (US) | 2000-06-06 | — | — | US | claimed |
| US-6066200-A | COMPRISING A SOLID UREA COMPOUND, AN ALCOHOL, A LIGHTFASTNESS COMPONENT, A LIGHTFAST ANTIOXIDANT, AND A COLORANT | XEROX CORPORATION (US) | 2000-05-23 | — | — | US | claimed |
| US-5922117-A | Ink compositions containing alcohols | XEROX CORPORATION (US) | 1999-07-13 | — | — | US | claimed |
| US-20250110407-A1 | SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD, AND RESIST BASE FILM FORMING COMPOSITION | JSR CORPORATION (JP) | 2025-04-03 | — | — | US | disclosed |
| US-20240142876-A1 | SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION | JSR CORPORATION (JP) | 2024-05-02 | — | — | US | disclosed |
| US-20240105451-A1 | SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION | JSR CORPORATION (JP) | 2024-03-28 | — | — | US | disclosed |
| WO-2023199881-A1 | METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE AND RESIST UNDERLAYER FILM FORMING COMPOSITION | JSR株式会社 | 2023-10-19 | — | — | WO | disclosed |
| CN-111562720-B | Photo-sensitized chemically amplified resist material, pattern forming method, semiconductor device, mask for lithography, and template for nanoimprint | 东京毅力科创株式会社 | 2023-09-29 | — | — | CN | disclosed |
| WO-2022259885-A1 | SEMICONDUCTOR SUBSTRATE PRODUCTION METHOD AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | JSR株式会社 | 2022-12-15 | — | — | WO | disclosed |
| WO-2022244682-A1 | SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD, AND RESIST BASE FILM FORMING COMPOSITION | JSR株式会社 | 2022-11-24 | — | — | WO | disclosed |
| EP-0396065-A1 | Novel amino acid derivatives possessing renin-inhibitory activities | Japan Tobacco Inc. (JP) | 1990-11-07 | — | — | EP | disclosed |
| EP-0218688-B1 | DIHALO-STATINE SUBSTITUTED RENIN INHIBITORS | THE UPJOHN COMPANY (US) | 1990-09-12 | — | — | EP | disclosed |
| EP-0349570-A1 | RENIN INHIBITORS CONTAINING A CYCLOPROPYL AMINO ACID AND/OR A CYCLOALKYL TRANSITION-STATE ANALOGUE | THE UPJOHN COMPANY (US) | 1990-01-10 | — | — | EP | disclosed |
| US-4882420-A | HYPOTENSIVE AGENTS; CARDIOVASCULAR DISORDERS | THE UPJOHN COMPANY (US) | 1989-11-21 | — | — | US | disclosed |
| WO-1988007053-A1 | RENIN INHIBITORS CONTAINING A CYCLOPROPYL AMINO ACID AND/OR A CYCLOALKYL TRANSITION-STATE ANALOGUE | THE UPJOHN COMPANY (US) | 1988-09-22 | — | — | WO | disclosed |
| EP-0218688-A1 | DIHALO-STATINE SUBSTITUTED RENIN INHIBITORS. | UPJOHN CO (US) | 1987-04-22 | — | — | EP | disclosed |
| WO-1986006379-A1 | DIHALO-STATINE SUBSTITUTED RENIN INHIBITORS | THE UPJOHN COMPANY (US) | 1986-11-06 | — | — | WO | disclosed |