Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.47 |
| ▸ | MAPT | P10636 | 2/20 | 0.40 |
| ▸ | GSTP1 | P09211 | 1/20 | 0.37 |
| ▸ | HCAR2 | Q8TDS4 | 2/20 | 0.34 |
| ▸ | ATM | Q13315 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL573015 | 1.00 | TSHR (0.47) | TSHRMAPTGSTP1HCAR2ATM | |
| SCHEMBL30172130 | 1.00 | TSHR (0.47) | TSHRMAPTGSTP1HCAR2ATM | |
| SCHEMBL7934533 | 0.89 | TSHR (0.46) | TSHRMAPTGSTP1HCAR2ATM | |
| SCHEMBL7934532 | 0.89 | TSHR (0.46) | TSHRMAPTGSTP1HCAR2ATM | |
| SCHEMBL4444141 | 0.89 | TSHR (0.52) | TSHRMAPTHCAR2ATMALDH1A1 | |
| SCHEMBL2808160 | 0.89 | TSHR (0.52) | TSHRMAPTHCAR2ATMALDH1A1 | |
| SCHEMBL2465097 | 0.89 | TSHR (0.52) | TSHRMAPTHCAR2ATMALDH1A1 | |
| SCHEMBL9396218 | 0.86 | TSHR (0.42) | TSHRMAPTHCAR2ATMALDH1A1 | |
| SCHEMBL9396224 | 0.86 | TSHR (0.42) | TSHRMAPTHCAR2ATMALDH1A1 | |
| SCHEMBL2866953 | 0.85 | HSD17B10 (0.38) | TSHRMAPTGSTP1HCAR2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 108 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9040630-B2 | Graft copolymers of polyfarnesenes with condensation polymers | Amyris, Inc. (US) | 2015-05-26 | — | — | US | claimed |
| EP-2601229-B1 | GRAFT COPOLYMERS OF POLYFARNESENES WITH CONDENSATION POLYMERS | AMYRIS INC (US) | 2013-10-16 | — | — | EP | claimed |
| EP-2601229-A1 | GRAFT COPOLYMERS OF POLYFARNESENES WITH CONDENSATION POLYMERS | Amyris, Inc. (US) | 2013-06-12 | — | — | EP | claimed |
| US-20130123379-A1 | GRAFT COPOLYMERS OF POLYFARNESENES WITH CONDENSATION POLYMERS | Amyris, Inc. (US) | 2013-05-16 | — | — | US | claimed |
| WO-2012018682-A1 | GRAFT COPOLYMERS OF POLYFARNESENES WITH CONDENSATION POLYMERS | Amyris, Inc. (US) | 2012-02-09 | — | — | WO | claimed |
| US-20100240824-A1 | POWDER COATING SUSPENSIONS (POWDER SLURRIES) AND POWDER COATING MATERIALS, THEIR PREPARATION AND USE | BASF COATINGS AG (DE) | 2010-09-23 | — | — | US | claimed |
| CN-118812769-A | Janus structure polymer epidermis patch electrode induced by picrylide and preparation method thereof | 江苏师范大学 | 2024-10-22 | — | — | CN | disclosed |
| US-20240045329-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELECTRONIC COMPONENT, ANTENNA ELEMENT, SEMICONDUCTOR PACKAGE, AND COMPOUND | TORAY INDUSTRIES, INC. (JP) | 2024-02-08 | — | — | US | disclosed |
| US-10294342-B2 | Film obtained by laminating coating layer made of fluorine-containing acrylic resin on base film | KANEKA CORPORATION (JP) | 2019-05-21 | — | — | US | disclosed |
| EP-1666969-B1 | PHOTOSENSITIVE INSULATING RESIN COMPOSITION AND CURED PRODUCT THEREOF | JSR CORP (JP) | 2018-01-10 | — | — | EP | disclosed |
| US-9771436-B2 | Method for forming polymer using boron compound, polymerization initiator and the polymer | HITACHI, LTD. (JP) | 2017-09-26 | — | — | US | disclosed |
| US-20170058088-A1 | FILM OBTAINED BY LAMINATING COATING LAYER MADE OF FLUORINE-CONTAINING ACRYLIC RESIN ON BASE FILM | KANEKA CORPORATION (JP) | 2017-03-02 | — | — | US | disclosed |
| US-9356280-B2 | Lithium ion secondary battery electrode, method of manufacturing the same, and lithium ion secondary battery | NEC ENERGY DEVICES, LTD. (JP) | 2016-05-31 | — | — | US | disclosed |
| US-5731128-A | ELASTICITY, HARDNESS, ELONGATION; WATER DEVELOPABILITY | NIPPON PAINT CO., LTD. (JP) | 1998-03-24 | — | — | US | disclosed |
| EP-0745900-A1 | Water-developing photosensitive resin composition | Nippon Paint Co., Ltd. (JP) | 1996-12-04 | — | — | EP | disclosed |
| EP-0607962-B1 | Photosensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-07-17 | — | — | EP | disclosed |
| EP-0718695-A2 | Water-developable photosensitive resin composition | Nippon Paint Co., Ltd. (JP) | 1996-06-26 | — | — | EP | disclosed |
| US-5420187-A | Dispersant and monomer with polymerization catalyst and pigment | TOYO INK MANUFACTURING CO., LTD. (JP) | 1995-05-30 | — | — | US | disclosed |
| EP-0607962-A1 | Photosensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-07-27 | — | — | EP | disclosed |
| US-5064920-A | Terpolymer of a vinyl halide, hydroxyalkyl crotonate and vinyl ether or ester | TOAGOSEI CHEMICAL INDUSTRY CO., LTD. (JP) | 1991-11-12 | — | — | US | disclosed |