SCHEMBL573678

SCHEMBL573678

[Al].[As-3].[Ga].[In+3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5435835 0.89
SCHEMBL5451135 0.87
SCHEMBL2877684 0.87
SCHEMBL6311060 0.82
SCHEMBL339303 0.75
SCHEMBL2349953 0.75
SCHEMBL705240 0.75
SCHEMBL2350533 0.75
SCHEMBL2346595 0.75
SCHEMBL5440011 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11973315-B2 VCSEL with integrated electrodes APPLE INC. (US) 2024-04-30 US claimed
US-20220224078-A1 VCSEL with integrated electrodes APPLE INC. 2022-07-14 US claimed
US-11322910-B2 Indium-phosphide VCSEL with dielectric DBR APPLE INC. (US) 2022-05-03 US claimed
EP-3888138-A1 INDIUM-PHOSPHIDE VCSEL WITH DIELECTRIC DBR Apple Inc. (US) 2021-10-06 EP claimed
US-10833481-B2 Laser device with a stepped graded index separate confinement heterostructure INTEL CORPORATION (US) 2020-11-10 US claimed
US-20200274328-A1 Indium-phosphide VCSEL with dielectric DBR APPLE INC. 2020-08-27 US claimed
US-20190140426-A1 LASER DEVICE WITH A STEPPED GRADED INDEX SEPARATE CONFINEMENT HETEROSTRUCTURE INTEL CORPORATION 2019-05-09 US claimed
US-20110062495-A1 Field Effect Transistor with Access Region Recharge POWER INTEGRATIONS, INC. 2011-03-17 US claimed
EP-0279497-B1 CIRCUIT WITH CONDUCTING LINES FOR THE TRANSFER OF FAST SIGNALS LABORATOIRES D'ELECTRONIQUE PHILIPS (FR) 1993-05-26 EP claimed
EP-0111758-B1 LIQUID PHASE EPITAXIAL GROWTH METHOD FUJITSU LIMITED (JP) 1987-04-08 EP claimed
US-4592791-A Indium phosphide substrate; growing an aluminum, indium arsenic intermetallic by liquid phase epitaxy FUJITSU LIMITED (JP) 1986-06-03 US claimed
US-20240154390-A1 SEMICONDUCTOR OPTICAL ELEMENT MITSUBISHI ELECTRIC CORPORATION (JP) 2024-05-09 US disclosed
US-11973315-B2 VCSEL with integrated electrodes APPLE INC. (US) 2024-04-30 US disclosed
US-20220224078-A1 VCSEL with integrated electrodes APPLE INC. 2022-07-14 US disclosed
US-11322910-B2 Indium-phosphide VCSEL with dielectric DBR APPLE INC. (US) 2022-05-03 US disclosed
US-20040119129-A1 Unipolar photodiode having a schottky junction contact KEYSIGHT TECHNOLOGIES, INC. 2004-06-24 US disclosed
US-6740908-B1 Extended drift heterostructure photodiode having enhanced electron response AGILENT TECHNOLOGIES, INC. 2004-05-25 US disclosed
EP-0111758-B1 LIQUID PHASE EPITAXIAL GROWTH METHOD FUJITSU LIMITED (JP) 1987-04-08 EP disclosed
US-4592791-A Indium phosphide substrate; growing an aluminum, indium arsenic intermetallic by liquid phase epitaxy FUJITSU LIMITED (JP) 1986-06-03 US disclosed
EP-0111758-A1 Liquid phase epitaxial growth method FUJITSU LIMITED (JP) 1984-06-27 EP disclosed