SCHEMBL574293

SCHEMBL574293

CC(C)CCCP(CCCC(C)C)CCCC(C)C

nearest known ligand 0.45

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.45
BLM P54132 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5173441 0.97 LMNA (0.43) LMNABLM
SCHEMBL15657928 0.90 LMNA (0.50) LMNABLM
SCHEMBL476992 0.88 LMNA (0.48) LMNABLM
SCHEMBL9487732 0.88 LMNA (0.48) LMNABLM
SCHEMBL13937742 0.85 LMNA (0.39) LMNA
Bromide SCHEMBL6701291 0.84 LMNA (0.35) LMNA
Bromide SCHEMBL6703336 0.81 LMNA (0.36) LMNA
Acetic Acid SCHEMBL2462664 0.79 CA1 (0.41) LMNABLM
Bromide SCHEMBL6699888 0.79 LMNA (0.35) LMNA
SCHEMBL1313790 0.79 LMNA (0.35) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0216640-B1 Catalytic compound and process for production of silanes TOA NENRYO KOGYO KK (JP) 1994-08-03 EP claimed
US-4775651-A LITHIATION, HALOALKYLATION AND PHOSPHONIUM SALT FORMATION OF HIGH MOLECULAR WEIGHT AROMATIC COMPOUND TO PRODUCE DISPROPORTIVATION CATALYST TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) 1988-10-04 US claimed
EP-0216640-A2 Catalytic compound and process for production of silanes TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) 1987-04-01 EP claimed
EP-2735581-B1 COMPOSITION AND POLYMER ASAHI CHEMICAL IND (JP) 2021-07-14 EP disclosed
US-9738757-B2 Composition and polymer ASAHI KASEI CHEMICALS CORPORATION (JP) 2017-08-22 US disclosed
US-20160222168-A1 Composition and Polymer ASAHI KASEI CHEMICALS CORPORATION (JP) 2016-08-04 US disclosed
US-9334371-B2 Composition and polymer ASAHI KASEI CHEMICALS CORPORATION (JP) 2016-05-10 US disclosed
EP-2735581-A1 COMPOSITION AND POLYMER Asahi Kasei Chemicals Corporation (JP) 2014-05-28 EP disclosed
US-20140121293-A1 Composition and Polymer ASAHI KASEI CHEMICALS CORPORATION (JP) 2014-05-01 US disclosed
WO-2012017842-A1 TRIAZOLE DERIVATIVE, HETEROCYCLIC COMPOUND, LIGHT-EMITTING ELEMENT, LIGHT-EMITTING DEVICE, ELECTRONIC DEVICE AND LIGHTING DEVICE SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) 2012-02-09 WO disclosed
EP-0216640-B1 Catalytic compound and process for production of silanes TOA NENRYO KOGYO KK (JP) 1994-08-03 EP disclosed
US-4775651-A LITHIATION, HALOALKYLATION AND PHOSPHONIUM SALT FORMATION OF HIGH MOLECULAR WEIGHT AROMATIC COMPOUND TO PRODUCE DISPROPORTIVATION CATALYST TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) 1988-10-04 US disclosed
US-4725420-A USING CATALYST OF QUATERNARY PHOSPHONIUM SALT BONDED TO POLYMER TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) 1988-02-16 US disclosed
EP-0216640-A2 Catalytic compound and process for production of silanes TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) 1987-04-01 EP disclosed