SCHEMBL57744

SCHEMBL57744

CCCCCCCCOc1ccccc1[O]

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.58
MAPT P10636 2/20 0.58
MEN1 O00255 1/20 0.58
NR1I2 O75469 1/20 0.58
CHRM2 P08172 1/20 0.58
CYP3A4 P08684 1/20 0.58
ADRA2A P08913 1/20 0.58
OPRK1 P41145 1/20 0.58
HTR2B P41595 1/20 0.58
SLC6A3 Q01959 1/20 0.58
KMT2A Q03164 1/20 0.58
HDAC6 Q9UBN7 1/20 0.58
CYP1A2 P05177 1/20 0.52
CYP2C9 P11712 1/20 0.52
CYP2C19 P33261 1/20 0.52
CYSLTR2 Q9NS75 2/20 0.50
CYSLTR1 Q9Y271 2/20 0.50
PPARG P37231 2/20 0.49
L3MBTL1 Q9Y468 2/20 0.49
TSHR P16473 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL842761 1.00 LMNA (0.58) LMNAMAPTMEN1NR1I2CHRM2
SCHEMBL2679607 1.00 LMNA (0.58) LMNAMAPTMEN1NR1I2CHRM2
SCHEMBL2679170 1.00 LMNA (0.58) LMNAMAPTMEN1NR1I2CHRM2
SCHEMBL990251 1.00 LMNA (0.58) LMNAMAPTMEN1NR1I2CHRM2
SCHEMBL991008 1.00 LMNA (0.58) LMNAMAPTMEN1NR1I2CHRM2
SCHEMBL2679806 1.00 LMNA (0.58) LMNAMAPTMEN1NR1I2CHRM2
SCHEMBL991604 1.00 LMNA (0.58) LMNAMAPTMEN1NR1I2CHRM2
SCHEMBL991234 1.00 LMNA (0.58) LMNAMAPTMEN1NR1I2CHRM2
SCHEMBL2679382 1.00 LMNA (0.58) LMNAMAPTMEN1NR1I2CHRM2
SCHEMBL843196 0.98 MAPT (0.56) LMNAMAPTMEN1NR1I2CHRM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 275 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022059590-A1 LIGHT- OR HEAT-RESPONSIVE CLEAVAGE MOLECULAR LAYER 国立研究開発法人産業技術総合研究所 2022-03-24 WO disclosed
EP-2123695-B1 METAL THIETANE COMPOUND, POLYMERIZABLE COMPOSITION COMPRISING THE COMPOUND, RESIN, AND USE OF THE RESIN MITSUI CHEMICALS INC (JP) 2021-06-23 EP disclosed
EP-2597932-B1 MANUFACTURING METHOD FOR ORGANIC LIGHT-EMITTING DEVICE SUMITOMO CHEMICAL CO (JP) 2021-04-14 EP disclosed
EP-2680672-B1 METHOD FOR PRODUCING ORGANIC ELECTROLUMINESCENT ELEMENT SUMITOMO CHEMICAL CO (JP) 2021-03-31 EP disclosed
EP-2485289-B1 LAMINATED STRUCTURE, POLYMER, ELECTROLUMINESCENT ELEMENT, AND PHOTOELECTRIC CONVERSION ELEMENT SUMITOMO CHEMICAL CO (JP) 2021-03-03 EP disclosed
EP-2605621-B1 ORGANIC ELECTROLUMINESCENT ELEMENT AND METHOD OF PRODUCING SAME SUMITOMO CHEMICAL CO (JP) 2020-07-15 EP disclosed
EP-2846374-B1 Layered structure SUMITOMO CHEMICAL CO (JP) 2019-11-06 EP disclosed
EP-2692796-B1 COMPOSITION SUMITOMO CHEMICAL CO (JP) 2019-07-10 EP disclosed
EP-2597933-B1 MANUFACTURING METHOD FOR ORGANIC ELECTROLUMINESCENCE ELEMENT SUMITOMO CHEMICAL CO (JP) 2019-06-12 EP disclosed
EP-2518111-B1 COMPOSITION AND LUMINESCENT ELEMENT OBTAINED USING SAME SUMITOMO CHEMICAL CO (JP) 2019-03-13 EP disclosed
EP-1731547-A1 POLYMERIZABLE COMPOUNDS AND USE THEREOF Mitsui Chemicals, Inc. (JP) 2006-12-13 EP disclosed
EP-1661690-A1 METHOD OF PRODUCING THREE-DIMENSIONAL MODEL FUJI PHOTO FILM CO., LTD. (JP) 2006-05-31 EP disclosed
US-20040002576-A1 Polymer compound and polymer light emitting device using the same SUMITOMO CHEMICAL COMPANY, LIMITED 2004-01-01 US disclosed
EP-1344788-A1 Conjugated polymer comprising dibenzothiophene- or dibenzofuran-units and their use in polymer LEDs SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-09-17 EP disclosed
EP-0818512-B1 Quinoline derivative and use of same MITSUI CHEMICALS INC (JP) 2002-10-02 EP disclosed
US-6407242-B1 REACTING A PHTHALIMIDE COMPOUND WITH A QUINOLINE COMPOUND;ELECTROLUMINESCENCE MITSUI CHEMICALS, INC. (JP) 2002-06-18 US disclosed
US-6248497-B1 LIGHT SENSITIVE AND HEAT SENSITIVE RECORDING IMAGES FUJI PHOTO FILM CO., LTD. (JP) 2001-06-19 US disclosed
US-6132640-A ZINC COMPLEXES OF QUINOLINE MITSUI CHEMICALS, INC. (JP) 2000-10-17 US disclosed
US-6106999-A SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS MITSUI CHEMICALS (JP) 2000-08-22 US disclosed
EP-0818512-A1 Quinoline derivative and use of same MITSUI TOATSU CHEMICALS, Inc. (JP) 1998-01-14 EP disclosed