Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.52 |
| ▸ | TSHR | P16473 | 2/20 | 0.52 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.52 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.52 |
| ▸ | PDE10A | Q9Y233 | 1/20 | 0.43 |
| ▸ | GAA | P10253 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | HTT | P42858 | 1/20 | 0.42 |
| ▸ | CASP1 | P29466 | 1/20 | 0.41 |
| ▸ | GFER | P55789 | 1/20 | 0.41 |
| ▸ | HTR6 | P50406 | 1/20 | 0.40 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.39 |
| ▸ | LOXL2 | Q9Y4K0 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31175768 | 1.00 | ALDH1A1 (0.52) | ALDH1A1TSHRCYP3A4TDP1PDE10A | |
| SCHEMBL8095125 | 0.92 | GFER (0.48) | ALDH1A1TSHRCYP3A4TDP1PDE10A | |
| SCHEMBL8771412 | 0.90 | ALDH1A1 (0.43) | ALDH1A1TSHRCYP3A4TDP1PDE10A | |
| SCHEMBL8100088 | 0.90 | CYP3A4 (0.56) | ALDH1A1TSHRCYP3A4TDP1GFER | |
| SCHEMBL8087529 | 0.90 | CYP3A4 (0.56) | ALDH1A1TSHRCYP3A4TDP1GFER | |
| SCHEMBL8095022 | 0.90 | CYP3A4 (0.56) | ALDH1A1TSHRCYP3A4TDP1GFER | |
| SCHEMBL8085728 | 0.90 | CYP3A4 (0.56) | ALDH1A1TSHRCYP3A4TDP1GFER | |
| SCHEMBL8095618 | 0.90 | CYP3A4 (0.56) | ALDH1A1TSHRCYP3A4TDP1GFER | |
| SCHEMBL8093823 | 0.90 | CYP3A4 (0.56) | ALDH1A1TSHRCYP3A4TDP1GFER | |
| SCHEMBL8093203 | 0.90 | CYP3A4 (0.56) | ALDH1A1TSHRCYP3A4TDP1GFER |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 235 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-16 | — | — | US | disclosed |
| EP-4660704-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-20250355350-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-20 | — | — | US | disclosed |
| EP-4650874-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-19 | — | — | EP | disclosed |
| EP-4636485-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-10-22 | — | — | EP | disclosed |
| EP-4636011-A1 | POLYMER, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-10-22 | — | — | EP | disclosed |
| EP-4553100-A1 | POLYMER, POSITIVE AND NEGATIVE PHOTOSENSITIVE RESIN COMPOSITIONS, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-05-14 | — | — | EP | disclosed |
| CN-119955091-A | Polymer, positive-type negative-type photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, surface protective film, and electronic component | 信越化学工业株式会社 | 2025-05-09 | — | — | CN | disclosed |
| US-20250147420-A1 | Polymer, Positive And Negative Photosensitive Resin Compositions, Patterning Process, Method For Forming Cured Film, Interlayer Insulating Film, Surface Protective Film, And Electronic Component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-05-08 | — | — | US | disclosed |
| WO-2024052176-A1 | RHEOLOGY MODIFYING OF POLYMERS WITH A RADICAL INITIATOR AND THIOURETHANE | BASF SE (DE) | 2024-03-14 | — | — | WO | disclosed |
| WO-2001029126-A1 | STABILIZERS AND ANTIOZONANTS FOR ELASTOMERS | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2001-04-26 | — | — | WO | disclosed |
| WO-2000018833-A1 | SYNERGISTIC STABILIZING MIXTURES | GREAT LAKES CHEMICAL (EUROPE) GMBH (CH) | 2000-04-06 | — | — | WO | disclosed |
| EP-0714398-A1 | GAMMA CRYSTALLINE MODIFICATION OF 2,2',2\"-NITRILO TRIETHYL-TRIS-(3,3',5,5'-TETRA-TERT-BUTYL-1,1'-BIPHENYL-2,2'-DIYL)PHOSPHITE] | Ciba SC Holding AG (CH) | 1996-06-05 | — | — | EP | disclosed |
| WO-1995005387-A1 | GAMMA CRYSTALLINE MODIFICATION OF 2,2',2'-NITRILO[TRIETHYL-TRIS-(3,3',5,5'-TETRA-TERT-BUTYL-1,1'-BIPHENYL-2,2'-DIYL)PHOSPHITE] | CIBA-GEIGY AG (CH) | 1995-02-23 | — | — | WO | disclosed |
| EP-0359805-B1 | USE OF SOLIDS AS ANTIBLOCKING ADDITIVES FOR MARKER LIQUIDS | KAUFMANN R DATAPRINT (DE) | 1994-01-19 | — | — | EP | disclosed |
| EP-0368803-A1 | Lubricant compositions | CIBA-GEIGY AG (CH) | 1990-05-16 | — | — | EP | disclosed |
| EP-0359805-A1 | USE OF SOLIDS AS ANTIBLOCKING ADDITIVES FOR MARKER LIQUIDS. | KAUFMANN RAINER DATAPRINT (DE) | 1990-03-28 | — | — | EP | disclosed |
| WO-1989009247-A1 | USE OF SOLIDS AS ANTIBLOCKING ADDITIVES FOR MARKER LIQUIDS | DATAPRINT DATENDRUCKSYSTEM R. KAUFMAN KG (DE) | 1989-10-05 | — | — | WO | disclosed |
| EP-0328488-A2 | Asymmetric disulfides in lubricant compositions | CIBA-GEIGY AG (CH) | 1989-08-16 | — | — | EP | disclosed |
| EP-0322362-A1 | Thiadiazole derivatives as additives for lubricants | CIBA-GEIGY AG (CH) | 1989-06-28 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | ARCN1, PRDM9, LBR | ALDH1A1 3706/4885TSHR 3214/4885CYP3A4 2409/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.