SCHEMBL5809733

SCHEMBL5809733

CC(=CC1CCN(C)C(C)(C)C1(C)C)C(=O)O

nearest known ligand 0.34

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.31
GABRA1 P14867 1/20 0.31
TSHR P16473 1/20 0.31
GABRG2 P18507 1/20 0.31
RXRA P19793 1/20 0.31
GABRB3 P28472 1/20 0.31
RXRB P28702 1/20 0.31
GABRB2 P47870 1/20 0.31
RXRG P48443 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29875860 0.77 UGT2B7 (0.33)
SCHEMBL11004684 0.70 ALDH1A1 (0.33) ALDH1A1
SCHEMBL28404043 0.70
SCHEMBL1801231 0.69 TSHR (0.34) ALDH1A1GABRA1TSHRGABRG2RXRA
SCHEMBL28207230 0.69 ALDH1A1 (0.35) ALDH1A1GABRA1TSHRGABRG2RXRA
SCHEMBL29211950 0.68 SMN1; SMN2 (0.31) ALDH1A1
SCHEMBL28994940 0.67 CD81 (0.31) ALDH1A1GABRA1TSHRGABRG2RXRA
SCHEMBL14999725 0.66 ALDH1A1 (0.39) ALDH1A1GABRA1TSHRGABRG2RXRA
SCHEMBL17745706 0.66 KMT2A (0.39) ALDH1A1
SCHEMBL20357288 0.66 KMT2A (0.39) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110515270-B Photosensitive resin composition, pattern forming method, and method for manufacturing optical semiconductor device 信越化学工业株式会社 2024-07-12 CN disclosed
CN-117806081-A Laminate and method for producing laminate 富士胶片株式会社 2024-04-02 CN disclosed
CN-117621587-A Laminate and method for producing laminate 富士胶片株式会社 2024-03-01 CN disclosed
CN-117465091-A Laminate and electronic device 富士胶片株式会社 2024-01-30 CN disclosed
CN-108666224-B Semiconductor device, method of manufacturing the same, and laminate 信越化学工业株式会社 2023-09-05 CN disclosed
CN-108026405-B Resin emulsion for paint 株式会社日本触媒 2020-12-01 CN disclosed
WO-2006090917-A2 ULTRAVIOLET ABSORBING POLYMER FOR HIGH LIGHT RESISTANT RECORDING MATERIALS NIPPON SHOKUBAI CO., LTD. (JP) 2006-08-31 WO disclosed