Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 2/20 | 0.32 |
| ▸ | PPP5C | P53041 | 1/20 | 0.32 |
| ▸ | PPM1B | O75688 | 1/20 | 0.32 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.32 |
| ▸ | PPP1CC | P36873 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5275198 | 0.97 | SMN1; SMN2 (0.44) | SMN1; SMN2ALDH1A1TDP1PDK1TSHR | |
| SCHEMBL5820808 | 0.95 | ALDH1A1 (0.47) | SMN1; SMN2ALDH1A1TDP1TSHR | |
| SCHEMBL13935488 | 0.93 | ALDH1A1 (0.50) | SMN1; SMN2ALDH1A1TDP1 | |
| SCHEMBL5278688 | 0.93 | ALDH1A1 (0.50) | SMN1; SMN2ALDH1A1TDP1 | |
| SCHEMBL13935383 | 0.93 | ALDH1A1 (0.50) | SMN1; SMN2ALDH1A1TDP1 | |
| SCHEMBL14256301 | 0.93 | ALDH1A1 (0.50) | SMN1; SMN2ALDH1A1TDP1 | |
| SCHEMBL16556737 | 0.92 | ALDH1A1 (0.45) | SMN1; SMN2ALDH1A1TDP1TSHR | |
| SCHEMBL5822587 | 0.91 | SMN1; SMN2 (0.36) | SMN1; SMN2ALDH1A1TDP1PPM1BPTPN1 | |
| SCHEMBL13935572 | 0.89 | TSHR (0.35) | SMN1; SMN2TSHR | |
| SCHEMBL11759538 | 0.89 | TSHR (0.40) | SMN1; SMN2ALDH1A1TDP1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116004226-B | Composite perovskite quantum dot material, perovskite quantum dot composition, and preparation methods and applications thereof | 北京航空航天大学合肥创新研究院(北京航空航天大学合肥研究生院) | 2023-12-15 | — | — | CN | claimed |
| CN-116004226-A | Composite perovskite quantum dot material, perovskite quantum dot composition, and preparation methods and applications thereof | 北京航空航天大学合肥创新研究院(北京航空航天大学合肥研究生院) | 2023-04-25 | — | — | CN | claimed |
| CN-116004226-B | Composite perovskite quantum dot material, perovskite quantum dot composition, and preparation methods and applications thereof | 北京航空航天大学合肥创新研究院(北京航空航天大学合肥研究生院) | 2023-12-15 | — | — | CN | disclosed |
| CN-116004226-A | Composite perovskite quantum dot material, perovskite quantum dot composition, and preparation methods and applications thereof | 北京航空航天大学合肥创新研究院(北京航空航天大学合肥研究生院) | 2023-04-25 | — | — | CN | disclosed |
| US-9063415-B2 | Photocurable resin composition and novel siloxane compound | ADEKA CORPORATION (JP) | 2015-06-23 | — | — | US | disclosed |
| US-9017905-B2 | Chemically amplified positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-28 | — | — | US | disclosed |
| US-9017905-B2 | Chemically amplified positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-28 | — | — | US | disclosed |
| US-20140205949-A1 | PHOTOCURABLE RESIN COMPOSITION AND NOVEL SILOXANE COMPOUND | ADEKA CORPORATION (JP) | 2014-07-24 | — | — | US | disclosed |
| US-20140087294-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-03-27 | — | — | US | disclosed |
| US-20140087294-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-03-27 | — | — | US | disclosed |
| US-20080075883-A1 | PROCESS FOR PRODUCING MOLDED PRINTED MATERIAL, AND MOLDED PRINTED MATERIAL | FUJIFILM CORPORATION (JP) | 2008-03-27 | — | — | US | disclosed |
| EP-1632794-A2 | Radiation sensitive resin composition for forming microlens | JSR Corporation (JP) | 2006-03-08 | — | — | EP | disclosed |
| US-20060008735-A1 | Radiation sensitive resin composition for forming microlens | JSR CORPORATION (JP) | 2006-01-12 | — | — | US | disclosed |