SCHEMBL5826085

SCHEMBL5826085

CCCCCCCC(C=C(C)C(=O)O)CC

nearest known ligand 0.47

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
LCK P06239 1/20 0.47
PPARD Q03181 1/20 0.47
ZDHHC20 Q5W0Z9 1/20 0.47
ZDHHC2 Q9UIJ5 1/20 0.47
GPR84 Q9NQS5 7/20 0.44
FFAR1 O14842 2/20 0.44
MAPT P10636 1/20 0.43
TSHR P16473 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
FFAR4 Q5NUL3 1/20 0.41
ACE2 Q9BYF1 1/20 0.41
ZDHHC7 Q9NXF8 1/20 0.40
EP300 Q09472 1/20 0.39
FAAH O00519 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25358949 1.00 LCK (0.47) LCKPPARDZDHHC20ZDHHC2GPR84
SCHEMBL11803860 1.00 LCK (0.47) LCKPPARDZDHHC20ZDHHC2GPR84
SCHEMBL5826081 1.00 LCK (0.47) LCKPPARDZDHHC20ZDHHC2GPR84
SCHEMBL27498355 1.00 LCK (0.47) LCKPPARDZDHHC20ZDHHC2GPR84
SCHEMBL604709 0.98 LCK (0.44) LCKPPARDZDHHC20ZDHHC2GPR84
SCHEMBL26624434 0.93 LCK (0.50) LCKPPARDZDHHC20ZDHHC2GPR84
SCHEMBL11024665 0.93 LCK (0.50) LCKPPARDZDHHC20ZDHHC2GPR84
SCHEMBL27513963 0.93 LCK (0.50) LCKPPARDZDHHC20ZDHHC2GPR84
SCHEMBL11661583 0.93 LCK (0.50) LCKPPARDZDHHC20ZDHHC2GPR84
SCHEMBL11659422 0.93 LCK (0.50) LCKPPARDZDHHC20ZDHHC2GPR84

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117859097-A Method for manufacturing substrate with cured film, and element provided with substrate with cured film 东丽株式会社 2024-04-09 CN disclosed
EP-4299641-A1 POLYURETHANE RESIN COMPOSITION SUITABLE FOR EXTRUSION MOLDING Kuraray Co., Ltd. (JP) 2024-01-03 EP disclosed
US-20230265314-A1 RESIN COMPOSITION AND DISPLAY APPARATUS INCLUDING THE SAME SAMSUNG DISPLAY CO., LTD. (KR) 2023-08-24 US disclosed
CN-110419000-B Photosensitive silicone resin composition, cured film, and member for touch panel 东丽株式会社 2023-07-28 CN disclosed
CN-111771163-B Negative photosensitive coloring composition, cured film, and touch panel using same 东丽株式会社 2023-06-02 CN disclosed
CN-109320914-B Molding material, sheet molding material, block molding material, and fiber-reinforced composite material 三菱化学株式会社 2021-09-21 CN disclosed
EP-3208309-B1 RESIN COMPOSITION AND PRESS-MOLDED ARTICLE OF SAME MITSUBISHI CHEM CORP (JP) 2020-11-25 EP disclosed
EP-2395032-B1 POWDERY VINYL POLYMER, CURABLE RESIN COMPOSITION, AND CURED OBJECT MITSUBISHI CHEM CORP (JP) 2020-08-26 EP disclosed
CN-106459561-B Resin composition and press-molded article thereof 三菱化学株式会社 2020-02-14 CN disclosed
WO-2020032131-A1 COMPOUND,THIOL GENERATOR, COMPOSITION, CURED PRODUCT, AND CURED PRODUCT PRODUCTION METHOD 株式会社ADEKA 2020-02-13 WO disclosed
US-20180171038-A1 CURABLE COMPOSITION TOAGOSEI CO., LTD. (JP) 2018-06-21 US disclosed
US-20170282516-A1 RESIN COMPOSITION AND COMPRESSION-MOLDED ARTICLE OF SAME MITSUBISHI RAYON CO., LTD. (JP) 2017-10-05 US disclosed
EP-3208309-A1 RESIN COMPOSITION AND PRESS-MOLDED ARTICLE OF SAME Mitsubishi Chemical Corporation (JP) 2017-08-23 EP disclosed
US-20170130017-A1 TOW PREPREG, COMPOSITE MATERIAL PRESSURE VESSEL, AND METHOD FOR MANUFACTURING SAME MITSUBISHI RAYON CO., LTD. (JP) 2017-05-11 US disclosed
EP-3162842-A1 TOW PREPREG, COMPOSITE PRESSURE VESSEL, AND METHOD FOR MANUFACTURING SAME Mitsubishi Rayon Co., Ltd. (JP) 2017-05-03 EP disclosed
JP-2006284738-A NEGATIVE ENERGY-SENSITIVE RESIN COMPOSITION FOR FORMING GAP IN DISPLAY DEVICE, AND METHOD FOR FORMING SPACER ON DISPLAY ELEMENT SUBSTRATE USING THE COMPOSITION HITACHI CHEM CO LTD 2006-10-19 JP disclosed
CN-1234047-C Chemical amplification light resistance agent compsn. AMERICAN EVERBRIGHT CORP (US) 2005-12-28 CN disclosed
US-20050038194-A1 Pseudo cross-link type resin composition, molding material, sheet or film, and optical element obtained therefrom YAMANAKA TETSURO (JP) 2005-02-17 US disclosed
US-6767967-B2 FLEXIBILITY; HYDROGEN BONDED BLEND HITACHI CHEMICAL CO., LTD. (JP) 2004-07-27 US disclosed
CN-1462909-A Chemical amplification light resistance agent compsn. AMERICAN EVERBRIGHT CORP (US) 2003-12-24 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180171038-A1 CURABLE COMPOSITION KAT2B, ACR, GK LCK 1958/4885PPARD 3865/4885ZDHHC20 62/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.