Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | TSHR | P16473 | 3/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6575777 | 0.85 | ALDH1A1 (0.40) | ALDH1A1TSHRTHRB | |
| SCHEMBL25561 | 0.85 | ALDH1A1 (0.40) | ALDH1A1TSHRTHRB | |
| SCHEMBL17801655 | 0.85 | ALDH1A1 (0.40) | ALDH1A1TSHRTHRB | |
| SCHEMBL195788 | 0.84 | ALDH1A1 (0.39) | ALDH1A1TSHRTHRB | |
| SCHEMBL1512952 | 0.84 | ALDH1A1 (0.39) | ALDH1A1TSHRTHRB | |
| Methyl Alcohol SCHEMBL28203244 | 0.84 | ALDH1A1 (0.39) | ALDH1A1TSHRTHRB | |
| SCHEMBL3808301 | 0.84 | ALDH1A1 (0.39) | ALDH1A1TSHRTHRB | |
| Alcohol SCHEMBL23859971 | 0.82 | ALDH1A1 (0.38) | ALDH1A1TSHRTHRB | |
| SCHEMBL16536523 | 0.82 | ALDH1A1 (0.38) | ALDH1A1TSHRTHRB | |
| SCHEMBL16537953 | 0.82 | ALDH1A1 (0.38) | ALDH1A1TSHRTHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1706768-A2 | PROCESS FOR PRODUCING PHOTONIC CRYSTALS | 3M Innovative Properties Company (US) | 2006-10-04 | — | — | EP | disclosed |
| US-7005231-B2 | Positive type radiosensitive composition and method for forming pattern | JSR CORPORATION (JP) | 2006-02-28 | — | — | US | disclosed |
| WO-2005062091-A2 | PROCESS FOR PRODUCING PHOTONIC CRYSTALS BY IRRADIATION OF A PHOTOREACTIVE MATERIAL | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2005-07-07 | — | — | WO | disclosed |
| US-20050124712-A1 | Exposure using multibeam interference technique; three-dimensional pattern | 3M INNOVATIVE PROPERTIES COMPANY | 2005-06-09 | — | — | US | disclosed |
| US-20040197698-A1 | Positive type radiosensitive composition and method for forming pattern | JSR CORPORATION (JP) | 2004-10-07 | — | — | US | disclosed |
| EP-1411390-A1 | POSITIVE TYPE RADIOSENSITIVE COMPOSITION AND METHOD FOR FORMING PATTERN | JSR Corporation (JP) | 2004-04-21 | — | — | EP | disclosed |
| EP-0965618-B1 | Photo-curable composition and photo-cured product | JSR CORP (JP) | 2004-01-02 | — | — | EP | disclosed |
| US-6207728-B1 | COMPOSITION COMPRISING BOTH HYDROLYZABLE SILANE COMPOUND AND HYDROLYZATE THEREOF OR EITHER ONE, PHOTO ACID GENERATOR, DEHYDRATING AGENT | JSR CORPORATION (JP) | 2001-03-27 | — | — | US | disclosed |
| EP-0965618-A1 | Photo-curable composition and photo-cured product | JSR Corporation (JP) | 1999-12-22 | — | — | EP | disclosed |