Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.70 |
| ▸ | LMNA | P02545 | 2/20 | 0.66 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.57 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.57 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.57 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.57 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.55 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.53 |
| ▸ | F2 | P00734 | 1/20 | 0.52 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.52 |
| ▸ | TSHR | P16473 | 2/20 | 0.52 |
| ▸ | ESR1 | P03372 | 1/20 | 0.51 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.51 |
| ▸ | NPC1 | O15118 | 1/20 | 0.50 |
| ▸ | RAB9A | P51151 | 1/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.49 |
| ▸ | GAA | P10253 | 1/20 | 0.49 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28525418 | 0.98 | TDP1 (0.68) | TDP1LMNAMAPK1HIF1ASLC6A2 | |
| SCHEMBL28156890 | 0.91 | TDP1 (0.57) | TDP1LMNAMAPK1HIF1ASLC6A2 | |
| SCHEMBL25371286 | 0.89 | TDP1 (0.61) | TDP1LMNAMAPK1HIF1ASLC6A2 | |
| SCHEMBL4222754 | 0.88 | TDP1 (0.78) | TDP1LMNAMAPK1HIF1ASLC6A2 | |
| SCHEMBL137486 | 0.87 | TDP1 (0.83) | TDP1LMNAMAPK1HIF1ASLC6A2 | |
| SCHEMBL11264826 | 0.86 | TDP1 (0.52) | TDP1LMNAMAPK1SLC6A2ALDH1A1 | |
| SCHEMBL11876158 | 0.86 | TDP1 (0.68) | TDP1LMNAMAPK1HIF1ASLC6A2 | |
| SCHEMBL6935004 | 0.86 | TDP1 (0.68) | TDP1LMNAMAPK1HIF1ASLC6A2 | |
| SCHEMBL6327206 | 0.85 | TDP1 (0.79) | TDP1LMNAMAPK1HIF1ASLC6A2 | |
| SCHEMBL8013431 | 0.85 | TDP1 (0.79) | TDP1LMNAMAPK1HIF1ASLC6A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119978880-A | Inorganic silicate anti-skinning agent and application thereof in anti-insolation anti-skinning inorganic silicate paint | 立邦涂料(四川)有限公司 | 2025-05-13 | — | — | CN | claimed |
| EP-0539274-B1 | Method for the synthesis of aldehydes and of their derivatives | RHONE POULENC CHIMIE (FR) | 1996-04-10 | — | — | EP | claimed |
| CN-119978880-A | Inorganic silicate anti-skinning agent and application thereof in anti-insolation anti-skinning inorganic silicate paint | 立邦涂料(四川)有限公司 | 2025-05-13 | — | — | CN | disclosed |
| US-20230359119-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-09 | — | — | US | disclosed |
| CN-110998800-B | Polishing liquid, polishing liquid set and polishing method | 株式会社力森诺科 | 2023-09-22 | — | — | CN | disclosed |
| US-11649377-B2 | Polishing liquid, polishing liquid set and polishing method | RESONAC CORPORATION (JP) | 2023-05-16 | — | — | US | disclosed |
| US-20200299544-A1 | POLISHING LIQUID, POLISHING LIQUID SET AND POLISHING METHOD | RESONAC CORPORATION (JP) | 2020-09-24 | — | — | US | disclosed |
| CN-109970921-A | A kind of high water reduction muting sensitive sense polycarboxylate water-reducer and preparation method thereof | 科之杰新材料集团有限公司 | 2019-07-05 | — | — | CN | disclosed |
| US-20170133237-A1 | POLISHING LIQUID AND METHOD FOR POLISHING SUBSTRATE USING THE POLISHING LIQUID | HITACHI CHEMICAL CO LTD (JP) | 2017-05-11 | — | — | US | disclosed |
| US-9564337-B2 | Polishing liquid and method for polishing substrate using the polishing liquid | HITACHI CHEMICAL CO., LTD. (JP) | 2017-02-07 | — | — | US | disclosed |
| WO-2016115090-A1 | COMPOUNDS, COMPOSITIONS AND METHODS FOR INCREASING CFTR ACTIVITY | PROTEOSTASIS THERAPEUTICS, INC. (US) | 2016-07-21 | — | — | WO | disclosed |
| EP-1369906-B1 | POLISHING COMPOUND AND METHOD FOR POLISHING SUBSTRATE | HITACHI CHEMICAL CO LTD (JP) | 2012-06-27 | — | — | EP | disclosed |
| EP-2418258-A1 | Polishing slurry and method of polishing substrate | Hitachi Chemical Company, Ltd. (JP) | 2012-02-15 | — | — | EP | disclosed |
| US-20080154049-A1 | for acylation of an aromatic compound, comprising reacting an aromatic compound and an acylating agent of the carboxylic acid type, in the presence of a Lewis acid and of a silylated reagent selected from the group consisting of halosilanes and halosiloxanes. | SHASUN PHARMA SOLUTIONS LIMITED (GB) | 2008-06-26 | — | — | US | disclosed |
| US-6786945-B2 | Polishing compound and method for polishing substrate | HITACHI CHEMICAL CO., LTD. (JP) | 2004-09-07 | — | — | US | disclosed |
| US-20040065022-A1 | Polishing compound and method for polishing substrate | HITACHI CHEMICAL CO., LTD. (JP) | 2004-04-08 | — | — | US | disclosed |
| EP-1369906-A1 | POLISHING COMPOUND AND METHOD FOR POLISHING SUBSTRATE | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2003-12-10 | — | — | EP | disclosed |
| CN-1096292-C | Method for preparing bimetallic ruthenium/tin catalyst | PHODIA CHIMIE (FR) | 2002-12-18 | — | — | CN | disclosed |
| US-6180830-B1 | REDUCING COMPLEX OF RUTHENIUM HAVING ELECTROVALENCY OF-4 AND COORDINATION NUMBER OF 6, WHEREIN AT LEAST ONE LIGAND IS TIN HALIDE, OTHER LIGANDS OPTIONALLY BEING HALOGEN ATOMS | RHODIA CHIMIE (FR) | 2001-01-30 | — | — | US | disclosed |
| CN-1204271-A | Method for preparing bimetallic ruthenium/tin catalyst | PHODIA CHIMIE (FR) | 1999-01-06 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080154049-A1 | for acylation of an aromatic compound, comprising reacting an aromatic compound and an acylating agent of the carboxylic acid type, in the presence of a Lewis acid and of a silylated reagent selected from the group consisting of halosilanes and halosiloxanes. | AADAC, APEH, DDC | TDP1 4532/4885LMNA 1577/4885MAPK1 3767/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.