SCHEMBL58317

SCHEMBL58317

[Ba+2].[O-2].[O-2].[O-2].[Ti+4]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8686651 1.00
SCHEMBL29691684 1.00
SCHEMBL31736688 0.87
SCHEMBL3988009 0.87
SCHEMBL31558889 0.87
SCHEMBL2903397 0.87
SCHEMBL1981104 0.87
SCHEMBL58411 0.87
SCHEMBL21144537 0.87
SCHEMBL7148691 0.87

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 17399 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116058333-B Non-human animals with engineered immunoglobulin lambda light chains and uses thereof REGENERON PHARMACEUTICALS, INC. (US) 2026-05-26 CN claimed
WO-2026101342-A1 INSULATING LAYER COMPOSITION FOR SECONDARY BATTERY AND SECONDARY BATTERY COMPRISING SAME 나모케미칼 주식회사 2026-05-15 WO claimed
WO-2026101383-A1 INSULATING LAYER COMPOSITION FOR SECONDARY BATTERY AND SECONDARY BATTERY COMPRISING SAME 나모케미칼 주식회사 2026-05-15 WO claimed
US-12628383-B2 Transistors having stacked 2D material channel layers and heterogeneous 2D material contacts layers epitaxial to the 2D material channel layers INTEL CORPORATION (US) 2026-05-12 US claimed
US-12604484-B2 Semiconductor device including data storage structure and method of manufacturing data storage structure SAMSUNG ELECTRONICS CO., LTD. (KR) 2026-04-14 US claimed
US-20260090066-A1 SEMICONDUCTOR DEVICE COMPRISING HIGH-K AMORPHOUS FLUORINATED CARBON THIN FILM GATE DIELECTRIC LAYER AND MANUFACTURING METHOD THEREOF THE INDUSTRY & ACADEMIC COOPERATION IN CHUNGNAM NATIONAL UNIVERSITY (IAC) (KR) 2026-03-26 US claimed
US-20260081089-A1 BACKEND FIELD EMISSION DEVICES SHARMA ABHISHEK A (US) 2026-03-19 US claimed
US-20260068546-A1 MEMRISTIVE COMPUTING SCHEMES IN THE BACK-END-OF-THE-LINE APPLIED MATERIALS, INC. (US) 2026-03-05 US claimed
US-20260068547-A1 MEMRISTIVE COMPUTING SCHEMES IN THE BACK-END-OF-THE-LINE APPLIED MATERIALS, INC. (US) 2026-03-05 US claimed
US-20260047184-A1 METAL-INSULATOR-METAL CAPACITOR STRUCTURE, INTEGRATED CIRCUIT, AND METHOD FOR FORMING METAL-INSULATOR-METAL CAPACITOR STRUCTURE TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2026-02-12 US claimed
US-5383088-A Storage capacitor with a conducting oxide electrode for metal-oxide dielectrics INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1995-01-17 US claimed
US-5295122-A Flying head of a magneto-optical recording apparatus FUJI XEROX CO., LTD. (JP) 1994-03-15 US claimed
EP-0581948-A1 METHOD AND APPARATUS FOR COMPRESSING A LIGHT PULSE Hughes Aircraft Company (US) 1994-02-09 EP claimed
WO-1993017472-A1 METHOD AND APPARATUS FOR COMPRESSING A LIGHT PULSE HUGHES AIRCRAFT COMPANY (US) 1993-09-02 WO claimed
US-5222161-A Method and apparatus for compressing a light pulse HUGHES AIRCRAFT COMPANY (US) 1993-06-22 US claimed
US-4948769-A Zeolites useds in catalytic cracking UNILEVER PATENT HOLDINGS B.V. (NL) 1990-08-14 US claimed
US-4810358-A PRE-DEMETALLIZATION WITH BARIUM TITANATE AKZO N.V. (NL) 1989-03-07 US claimed
US-4791085-A ALSO CONTAINING ZEOLITE, CRYSTALLINE ALUMINUM SILICATES; RESISTANT TO CORROSION BY METALS AKZO N.V. (NL) 1988-12-13 US claimed
EP-0204543-A2 Catalystfor cracking hydrocarbons contaminated with vanadium UNILEVER PLC (GB) 1986-12-10 EP claimed
EP-0194536-A2 Barium titanate- containing fluidizable cracking catalyst composition AKZO N.V. (NL) 1986-09-17 EP claimed