SCHEMBL5833952

SCHEMBL5833952

CCC(C)(CC)[SiH](OC)OC

nearest known ligand 0.38

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.38
TDP1 Q9NUW8 2/20 0.38
ALDH1A1 P00352 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23273852 0.80
SCHEMBL3628425 0.80
SCHEMBL2049163 0.75 TSHR (0.38) TSHRTDP1ALDH1A1
SCHEMBL3908543 0.75
SCHEMBL5834542 0.73 TSHR (0.32) TSHRTDP1ALDH1A1
SCHEMBL2336566 0.71 TSHR (0.35) TSHRTDP1ALDH1A1
SCHEMBL6063026 0.71 TSHR (0.35) TSHRTDP1ALDH1A1
SCHEMBL3468154 0.71 TSHR (0.35) TSHRTDP1ALDH1A1
SCHEMBL9355982 0.71 TSHR (0.35) TSHRTDP1ALDH1A1
SCHEMBL2241346 0.69 ALDH1A1 (0.33) TSHRTDP1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10995268-B2 Etching composition effective to selectively wet etch a silicon nitride film LTCAM CO., LTD. (KR) 2021-05-04 US disclosed
CN-110551503-B Composition for wet etching silicon nitride LTCAM株式会社 2021-04-16 CN disclosed
CN-110551503-A Composition for wet etching silicon nitride LTCAM CO LTD 2019-12-10 CN disclosed
US-7005532-B2 Process of producing alkoxysilanes TOAGOSEI CO., LTD. (JP) 2006-02-28 US disclosed
US-20050020845-A1 Process of producing alkoxysilanes TOAGOSEI CO., LTD. (JP) 2005-01-27 US disclosed
EP-1428828-A1 PROCESS FOR PREPARATION OF ALKOXYSILANES TOAGOSEI CO., LTD. (JP) 2004-06-16 EP disclosed