SCHEMBL5836802

SCHEMBL5836802

CCCCOC(=O)C1C2C=CC(C2)C1C(=O)O

nearest known ligand 0.61

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
POLB P06746 3/20 0.61
ALDH1A1 P00352 5/20 0.57
SMN1; SMN2 Q16637 1/20 0.57
LMNA P02545 1/20 0.50
PPARG P37231 3/20 0.48
PPM1B O75688 1/20 0.44
PTPN1 P18031 1/20 0.44
PPP1CC P36873 1/20 0.44
RAB9A P51151 1/20 0.43
HTT P42858 1/20 0.41
PPP5C P53041 1/20 0.40
TDP1 Q9NUW8 2/20 0.40
CASP6 P55212 1/20 0.40
APEX1 P27695 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15612183 0.95 POLB (0.60) POLBALDH1A1SMN1; SMN2LMNAPPARG
SCHEMBL15612087 0.94 POLB (0.58) POLBALDH1A1SMN1; SMN2LMNAPPARG
SCHEMBL14566015 0.94 POLB (0.58) POLBALDH1A1SMN1; SMN2LMNAPPARG
SCHEMBL1451061 0.94 POLB (0.51) POLBALDH1A1SMN1; SMN2LMNAPPARG
SCHEMBL5837469 0.90 POLB (0.65) POLBALDH1A1SMN1; SMN2LMNAPPARG
SCHEMBL7911629 0.90 ALDH1A1 (0.64) POLBALDH1A1SMN1; SMN2LMNAPPARG
SCHEMBL7911627 0.90 ALDH1A1 (0.64) POLBALDH1A1SMN1; SMN2LMNAPPARG
SCHEMBL19323419 0.89 POLB (0.48) POLBALDH1A1SMN1; SMN2LMNAPPARG
SCHEMBL7911633 0.89 ALDH1A1 (0.62) POLBALDH1A1SMN1; SMN2LMNAPPARG
SCHEMBL31372435 0.87 PPARG (0.50) POLBALDH1A1SMN1; SMN2LMNAPPARG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024127977-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT 東京応化工業株式会社 2024-06-20 WO disclosed
US-20240182606-A1 METHOD FOR PRODUCING PROPYLENE COPOLYMER USING CATALYST SYSTEM HAVING IMPROVED COPOLYMERIZATION ACTIVITY HANWHA TOTALENERGIES PETROCHEMICAL CO., LTD. (KR) 2024-06-06 US disclosed
EP-4375303-A1 METHOD FOR PRODUCING PROPYLENE COPOLYMER USING CATALYST SYSTEM HAVING IMPROVED COPOLYMERIZATION ACTIVITY Hanwha TotalEnergies Petrochemical Co., Ltd. (KR) 2024-05-29 EP disclosed
EP-4361186-A1 SOLID CATALYST FOR PRODUCING POLYPROPYLENE AND METHOD FOR PREPARATION OF PROPYLENE-DERIVED POLYMER Hanwha TotalEnergies Petrochemical Co., Ltd. (KR) 2024-05-01 EP disclosed
CN-110366704-B Radiation-sensitive resin composition and electronic component 日本瑞翁株式会社(JP) 2023-01-13 CN disclosed
CN-111770964-B Resin composition and electronic component 日本瑞翁株式会社 2022-12-02 CN disclosed
CN-108885398-B Radiation-sensitive resin composition and electronic component 日本瑞翁株式会社 2022-11-29 CN disclosed
CN-114402258-A Radiation-sensitive resin composition 日本瑞翁株式会社 2022-04-26 CN disclosed
US-11169440-B2 Radiation-sensitive resin composition and electronic component ZEON CORPORATION (JP) 2021-11-09 US disclosed
EP-3345970-B1 RESIN COMPOSITION ZEON CORP (JP) 2021-07-28 EP disclosed
US-20160200914-A1 RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE ZEON CORPORATION (JP) 2016-07-14 US disclosed
US-20160202607-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND ELECTRONIC DEVICE ZEON CORPORATION (JP) 2016-07-14 US disclosed
US-20140087136-A1 RESIN COMPOSITION AND SEMICONDUCTOR DEVICE BOARD ZEON CORPORATION (JP) 2014-03-27 US disclosed
CN-103509142-A Solid catalyst for propylene polymerization and a method for preparation of polypropylene SAMSUNG TOTAL PETROCHEMICALS 2014-01-15 CN disclosed
US-7037993-B2 Norbornene-based ring-opening polymerization polymer, product of hydrogenation of norbornene-based ring-opening polymerization polymer, and processes for producing these ZEON CORPORATION (JP) 2006-05-02 US disclosed
US-20050148746-A1 Norbornene-based ring-opening polymerization polymer, product of hydrogenation of norbornene-based ring-opening polymerization polymer, and processes for producing these ZEON CORPORATION (JP) 2005-07-07 US disclosed
EP-0003240-B1 EMULSIONS OF VINYL RESINS AND THEIR USE IN COATING COMPOSITIONS UNION CARBIDE CORPORATION (US) 1982-07-21 EP disclosed
US-4182699-A SOLVENT AND COSOLVENT IONOMERS UNION CARBIDE CORPORATION (US) 1980-01-08 US disclosed
EP-0003240-A1 Emulsions of vinyl resins and their use in coating compositions UNION CARBIDE CORPORATION (US) 1979-08-08 EP disclosed
US-4060508-A Stabilizer composition for chlorine-containing polymers MIZUSAWA KAGAKU KOGYO KABUSHIKI KAISHA (JA) 1977-11-29 US disclosed