SCHEMBL5843593

SCHEMBL5843593

CCCCCCOc1cc2ccc(S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)c3ccccc3C)cc2cc1OCCCCCC

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PPARG P37231 4/20 0.38
PPARA Q07869 4/20 0.38
S1PR3 Q99500 1/20 0.38
TLR8 Q9NR97 2/20 0.35
WDR5 P61964 2/20 0.35
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
NR1I2 O75469 1/20 0.34
LMNA P02545 1/20 0.34
CHRM2 P08172 1/20 0.34
CYP3A4 P08684 1/20 0.34
ADRA2A P08913 1/20 0.34
MAPT P10636 1/20 0.34
OPRK1 P41145 1/20 0.34
HTR2B P41595 1/20 0.34
SLC6A3 Q01959 1/20 0.34
HDAC6 Q9UBN7 1/20 0.34
PTPN1 P18031 1/20 0.34
ESR1 P03372 1/20 0.34
ATM Q13315 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5881824 0.91 PTPN11 (0.40) MEN1KMT2AESR1ATMESR2
SCHEMBL5843751 0.91 S1PR3 (0.42) S1PR3WDR5MEN1KMT2ANR1I2
SCHEMBL5844204 0.90 S1PR3 (0.44) PPARGPPARAS1PR3TLR8PTPN1
SCHEMBL5845575 0.90 S1PR3 (0.44) PPARGPPARAS1PR3TLR8PTPN1
SCHEMBL5843439 0.90 S1PR3 (0.44) PPARGPPARAS1PR3TLR8PTPN1
SCHEMBL5845206 0.90 S1PR3 (0.44) PPARGPPARAS1PR3TLR8PTPN1
SCHEMBL5844477 0.90 S1PR3 (0.44) PPARGPPARAS1PR3TLR8PTPN1
SCHEMBL5844003 0.89 S1PR3 (0.43) PPARGPPARAS1PR3TLR8PTPN1
SCHEMBL5881983 0.88 RAPGEF3 (0.39) MEN1KMT2ALMNAESR1ATM
SCHEMBL5844059 0.88 S1PR3 (0.41) PPARGPPARAS1PR3TLR8WDR5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7101651-B2 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO.,LTD. (JP) 2006-09-05 US disclosed
US-20040166432-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-08-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040166432-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process VEGFA, POLL, PIM3 PPARG 437/4885PPARA 49/4885S1PR3 1891/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.