⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17144398 | 0.90 | — | — | |
| SCHEMBL6114549 | 0.81 | CYP3A4 (0.31) | — | |
| SCHEMBL13286768 | 0.75 | ADORA2B (0.36) | — | |
| SCHEMBL27968123 | 0.72 | MAPT (0.34) | — | |
| SCHEMBL302029 | 0.71 | APEX1 (0.31) | — | |
| SCHEMBL19872816 | 0.70 | MEN1 (0.35) | — | |
| SCHEMBL181982 | 0.70 | CYP3A4 (0.54) | — | |
| SCHEMBL6114572 | 0.69 | — | — | |
| SCHEMBL29252281 | 0.69 | DAO (0.39) | — | |
| SCHEMBL28539145 | 0.69 | CYP3A4 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240210827-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-06-27 | — | — | US | disclosed |
| WO-2024095777-A1 | RESIN COMPOSITION | 日本ゼオン株式会社 | 2024-05-10 | — | — | WO | disclosed |
| WO-2023182412-A1 | RESIN PANEL FOR INFRARED SENSOR, AND INFRARED SENSOR AND ARTICLE EMPLOYING SAID RESIN PANEL | 大日本印刷株式会社 | 2023-09-28 | — | — | WO | disclosed |
| WO-2023078367-A1 | SECONDARY BATTERY | 珠海冠宇电池股份有限公司 | 2023-05-11 | — | — | WO | disclosed |
| WO-2023053976-A1 | RESIN COMPOSITION | 日本ゼオン株式会社 | 2023-04-06 | — | — | WO | disclosed |
| WO-2022210788-A1 | PHOTOSENSITIVE RESIN COMPOSITION | 味の素株式会社 | 2022-10-06 | — | — | WO | disclosed |
| CN-110662805-B | Silicone resin composition, adhesive using same, display device, semiconductor device, and lighting device | 东丽株式会社 | 2022-02-08 | — | — | CN | disclosed |
| US-10990008-B2 | Resin composition | TORAY INDUSTRIES, INC. (JP) | 2021-04-27 | — | — | US | disclosed |
| US-20200409263-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2020-12-31 | — | — | US | disclosed |
| US-10831101-B2 | Photosensitive resin composition, method for manufacturing cured relief pattern, and semiconductor apparatus | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2020-11-10 | — | — | US | disclosed |
| EP-1832613-B9 | GRAFT COPOLYMER, METHOD FOR PRODUCING SAME AND RESIN COMPOSITION CONTAINING SUCH GRAFT COPOLYMER | KANEKA CORP (JP) | 2012-08-29 | — | — | EP | disclosed |
| EP-1832613-B1 | GRAFT COPOLYMER, METHOD FOR PRODUCING SAME AND RESIN COMPOSITION CONTAINING SUCH GRAFT COPOLYMER | KANEKA CORP (JP) | 2012-02-15 | — | — | EP | disclosed |
| EP-1746116-B1 | COPOLYMER, GRAFT COPOLYMER, GRAFT COPOLYMER PARTICLE, FLAME RETARDANT, AND RESIN COMPOSITION | KANEKA CORP (JP) | 2011-07-06 | — | — | EP | disclosed |
| US-7855257-B2 | Copolymer, graft copolymer, graft copolymer particles, flame retardant, and resin composition | KANEKA CORPORATION (JP) | 2010-12-21 | — | — | US | disclosed |
| US-20100204404-A1 | LIQUID RESIN COMPOSITION AND CURED PRODUCT USING THE LIQUID RESIN COMPOSITION | KANEKA CORPORATION | 2010-08-12 | — | — | US | disclosed |
| EP-2189502-A1 | LIQUID RESIN COMPOSITION AND CURED PRODUCT USING THE LIQUID RESIN COMPOSITION | Kaneka Corporation (JP) | 2010-05-26 | — | — | EP | disclosed |
| US-20080085975-A1 | Graft Copolymer, Method For Producing The Same And Resin Composition Containing The Graft Copolymer | KANEKA CORPORATION (JP) | 2008-04-10 | — | — | US | disclosed |
| US-20070219319-A1 | Copolymer, Graft Copolymer, Graft Copolymer Particles, Flame Retardant, and Resin Composition | KANEKA CORPORATION | 2007-09-20 | — | — | US | disclosed |
| EP-1832613-A1 | GRAFT COPOLYMER, METHOD FOR PRODUCING SAME AND RESIN COMPOSITION CONTAINING SUCH GRAFT COPOLYMER | Kaneka Corporation (JP) | 2007-09-12 | — | — | EP | disclosed |
| EP-1746116-A1 | COPOLYMER, GRAFT COPOLYMER, GRAFT COPOLYMER PARTICLE, FLAME RETARDANT, AND RESIN COMPOSITION | Kaneka Corporation (JP) | 2007-01-24 | — | — | EP | disclosed |