SCHEMBL5845161

SCHEMBL5845161

CCCCOc1ccc(S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)c2ccccc2)c(OCCCC)c1OCCCC

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CCNE2 O96020 1/20 0.38
CCNE1 P24864 1/20 0.38
CDK2 P24941 1/20 0.38
WDR5 P61964 3/20 0.36
ALDH1A1 P00352 1/20 0.36
TSHR P16473 1/20 0.36
ABCB1 P08183 2/20 0.36
SLC2A1 P11166 1/20 0.35
TDP1 Q9NUW8 2/20 0.35
GAA P10253 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
S1PR3 Q99500 1/20 0.35
PTGES O14684 1/20 0.35
ALOX5 P09917 1/20 0.35
PPARG P37231 1/20 0.35
KAT6A Q92794 1/20 0.34
FABP4 P15090 5/20 0.33
FABP5 Q01469 5/20 0.33
ABCC1 P33527 1/20 0.33
CYP1A2 P05177 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5844576 0.92 KDM4E (0.37) WDR5ALDH1A1TSHRSLC2A1TDP1
SCHEMBL5843699 0.88 S1PR3 (0.39) ALDH1A1S1PR3FABP4FABP5
SCHEMBL5844229 0.87 S1PR3 (0.41) CDK2ALDH1A1S1PR3FABP4FABP5
SCHEMBL5844555 0.87 S1PR3 (0.41) CDK2ALDH1A1S1PR3FABP4FABP5
SCHEMBL5845019 0.87 S1PR3 (0.41) CDK2ALDH1A1S1PR3FABP4FABP5
SCHEMBL5844323 0.87 S1PR3 (0.41) CDK2ALDH1A1S1PR3FABP4FABP5
SCHEMBL5844215 0.87 S1PR3 (0.41) CDK2ALDH1A1S1PR3FABP4FABP5
SCHEMBL5843570 0.84 LMNA (0.37) ALDH1A1SLC2A1S1PR3FABP4FABP5
SCHEMBL5844057 0.82 KAT6A (0.41) WDR5TSHRABCB1S1PR3PTGES
SCHEMBL5845439 0.82 KAT6A (0.41) TSHRS1PR3PTGESALOX5PPARG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7101651-B2 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO.,LTD. (JP) 2006-09-05 US disclosed
US-20040166432-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-08-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040166432-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process VEGFA, POLL, PIM3 CCNE2 2480/4885CCNE1 2593/4885CDK2 1991/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.