Methacrylic Acid

Methacrylic Acid

SCHEMBL5847656

C=C(C)C(=O)O.CC(=CC(O)CCCCCO)C(=O)O

nearest known ligand 0.34

Full drug profile on Sugi Atlas →

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
GPR84 Q9NQS5 4/20 0.34
FFAR1 O14842 3/20 0.34
FFAR4 Q5NUL3 2/20 0.34
PTPN1 P18031 1/20 0.33
FNTA P49354 1/20 0.32
FNTB P49356 1/20 0.32
PPARG P37231 2/20 0.30
KDM4E B2RXH2 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30
GPR132 Q9UNW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL22572622 1.00 GPR84 (0.34) GPR84FFAR1FFAR4PTPN1FNTA
Methacrylic Acid SCHEMBL22572665 1.00 GPR84 (0.34) GPR84FFAR1FFAR4PTPN1FNTA
Methacrylic Acid SCHEMBL6381532 1.00 GPR84 (0.34) GPR84FFAR1FFAR4PTPN1FNTA
Methacrylic Acid SCHEMBL22572606 1.00 GPR84 (0.34) GPR84FFAR1FFAR4PTPN1FNTA
Methacrylic Acid SCHEMBL5163046 1.00 GPR84 (0.34) GPR84FFAR1FFAR4PTPN1FNTA
Methacrylic Acid SCHEMBL22572639 1.00 GPR84 (0.34) GPR84FFAR1FFAR4PTPN1FNTA
Methacrylic Acid SCHEMBL3804880 0.93 PTPN1 (0.31) PTPN1
SCHEMBL993417 0.93 GPR84 (0.39) GPR84FFAR1FFAR4PTPN1FNTA
SCHEMBL9742958 0.93 GPR84 (0.39) GPR84FFAR1FFAR4PTPN1FNTA
SCHEMBL230415 0.93 GPR84 (0.39) GPR84FFAR1FFAR4PTPN1FNTA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3338756-B1 STORAGE-STABLE RESIN-MODIFIED GLASS IONOMER CEMENT VOCO GMBH (DE) 2020-02-26 EP claimed
US-12202965-B2 Block copolymer composition for flexographic plate ZEON CORPORATION (JP) 2025-01-21 US disclosed
EP-3778251-B1 BLOCK COPOLYMER COMPOSITION FOR FLEXOGRAPHIC PRINTING PLATE ZEON CORP (JP) 2023-12-27 EP disclosed
EP-3778251-A1 BLOCK COPOLYMER COMPOSITION FOR FLEXOGRAPHIC PRINTING PLATE Zeon Corporation (JP) 2021-02-17 EP disclosed
US-20210040308-A1 BLOCK COPOLYMER COMPOSITION FOR FLEXOGRAPHIC PLATE ZEON CORPORATION (JP) 2021-02-11 US disclosed
US-7141614-B2 Photosensitive resin composition and photosensitive films and laminates made by using the same KANEKA CORPORATION (JP) 2006-11-28 US disclosed
US-20040265731-A1 Photosensitive resin composition and photosensitive films and laminates made by using the same KANEKA CORPORATION (JP) 2004-12-30 US disclosed
US-5759743-A FLOCCULATION; SEPARATION NIPPON PAINT CO., LTD. (JP) 1998-06-02 US disclosed
EP-0624828-A1 DEVELOPER CIRCULATING METHOD IN FLEXOGRAPHIC PLATE MAKING STEP AND APPARATUS FOR PRACTICING THE SAME Nippon Paint Co., Ltd. (JP) 1994-11-17 EP disclosed