⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5850549 | 0.80 | — | — | |
| SCHEMBL21116728 | 0.75 | — | — | |
| SCHEMBL5193817 | 0.75 | — | — | |
| SCHEMBL22855769 | 0.75 | — | — | |
| SCHEMBL20975631 | 0.75 | KDM4E (0.35) | — | |
| SCHEMBL10141590 | 0.75 | — | — | |
| SCHEMBL19803965 | 0.75 | — | — | |
| SCHEMBL14867122 | 0.75 | — | — | |
| SCHEMBL10291121 | 0.73 | — | — | |
| SCHEMBL18906433 | 0.73 | F2 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1354897-B1 | POLYMER FOR PHOTORESIST AND RESIN COMPOSITIONS THEREFOR | DAICEL CHEM (JP) | 2012-10-24 | — | — | EP | disclosed |
| US-7105268-B2 | Polymer for photoresist and resin compositions therefor | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-12 | — | — | US | disclosed |
| US-6992197-B2 | Lactone compound | TAKASAGO INTERNATIONAL CORPORATION (JP) | 2006-01-31 | — | — | US | disclosed |
| CN-1234047-C | Chemical amplification light resistance agent compsn. | AMERICAN EVERBRIGHT CORP (US) | 2005-12-28 | — | — | CN | disclosed |
| CN-1228359-C | High molecular polymer of chemical amplification type light resistance agent compsn. | AMERICAN EVERBRIGHT INC (US) | 2005-11-23 | — | — | CN | disclosed |
| US-20050032887-A1 | useful as a monomer for forming resins for paints, adhesives, binders, inks, resists, etc., and an alcohol compound having a lactone moiety useful as a material therefor | TAKASAGO INTERNATIONAL CORPORATION (JP) | 2005-02-10 | — | — | US | disclosed |
| US-6703178-B2 | COMPRISES A POLYMER CONTAINING A NOVEL LACTONE ALICYCLIC UNIT; WELL-BALANCED OUTCOME OF ETCHING RESISTANCE AND SUBSTRATE ADHESION | EVERLIGHT USA, INC. | 2004-03-09 | — | — | US | disclosed |
| CN-1462757-A | High molecular polymer of chemical amplification type light resistance agent compsn. | AMERICAN EVERBRIGHT INC (US) | 2003-12-24 | — | — | CN | disclosed |
| CN-1462909-A | Chemical amplification light resistance agent compsn. | AMERICAN EVERBRIGHT CORP (US) | 2003-12-24 | — | — | CN | disclosed |
| US-20030229234-A1 | Monomer for chemical amplified photoresist compositions | EVERLIGHT USA, INC. (US) | 2003-12-11 | — | — | US | disclosed |
| US-6639035-B1 | Acrylate copolymers including fused ring monomers; adhesive; hydrophilic; heat and dry etch resistance; ultraviolet radia-tion transparency | EVERLIGHT USA, INC. | 2003-10-28 | — | — | US | disclosed |
| EP-1354897-A1 | POLYMER FOR PHOTORESIST AND RESIN COMPOSITIONS THEREFOR | Daicel Chemical Industries, Ltd. (JP) | 2003-10-22 | — | — | EP | disclosed |
| US-20030148210-A1 | Polymer for photoresist and resin compositions therefor | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-08-07 | — | — | US | disclosed |