SCHEMBL585030

SCHEMBL585030

C=COC(=O)C(Cl)CCCCC

nearest known ligand 0.40

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ZDHHC7 Q9NXF8 1/20 0.40
TSHR P16473 3/20 0.39
HPGD P15428 1/20 0.39
GPR84 Q9NQS5 5/20 0.36
CA1 P00915 2/20 0.36
FFAR1 O14842 1/20 0.36
HCAR2 Q8TDS4 2/20 0.36
PLA2G2C Q5R387 1/20 0.35
MAPT P10636 1/20 0.35
LCK P06239 1/20 0.35
PPARD Q03181 1/20 0.35
ZDHHC20 Q5W0Z9 1/20 0.35
ZDHHC2 Q9UIJ5 1/20 0.35
FAAH O00519 1/20 0.35
ABCB1 P08183 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7136096 0.98 ZDHHC7 (0.42) ZDHHC7TSHRHPGDGPR84FFAR1
SCHEMBL9010895 0.87 TSHR (0.35) TSHRHPGD
SCHEMBL28144331 0.81 ZDHHC7 (0.42) ZDHHC7TSHRHPGDGPR84CA1
SCHEMBL491649 0.80 ZDHHC7 (0.44) ZDHHC7TSHRHPGDGPR84FFAR1
SCHEMBL27836687 0.80 ZDHHC7 (0.44) ZDHHC7TSHRHPGDGPR84FFAR1
SCHEMBL9285476 0.80 CA1 (0.50) ZDHHC7TSHRHPGDGPR84CA1
SCHEMBL28006557 0.80 ZDHHC7 (0.44) ZDHHC7TSHRHPGDGPR84FFAR1
SCHEMBL4308158 0.79 TSHR (0.56) ZDHHC7TSHRHPGDGPR84FFAR1
SCHEMBL1087568 0.79
SCHEMBL29190383 0.79 ZDHHC7 (0.46) ZDHHC7GPR84CA1FFAR1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3521924-A1 OPTICAL SHEET, SCREEN, AND DISPLAY DEVICE Dai Nippon Printing Co., Ltd. (JP) 2019-08-07 EP disclosed
EP-1267210-B1 Positive resist composition FUJIFILM CORP (JP) 2018-02-21 EP disclosed
US-8592540-B2 Fluorine-containing compound, fluorine-containing polymer compound, resist composition and patterning method using same CENTRAL GLASS COMPANY, LIMITED (JP) 2013-11-26 US disclosed
EP-1367439-B1 Radiation-sensitive composition FUJIFILM CORP (JP) 2012-08-01 EP disclosed
EP-1653256-B1 FLUID COLLOID CRYSTAL AND PROCESS FOR PRODUCING THREE-DIMENSIONAL ALIGNED PARTICLE MASS THEREFROM SOKEN KAGAKU KK (JP) 2012-02-15 EP disclosed
US-20110318542-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition and Patterning Method Using Same CENTRAL GLASS COMPANY, LIMITED (JP) 2011-12-29 US disclosed
EP-1568715-B1 PROCESS FOR MICROCHANNEL PRODUCTION OF COLORED SPHERICAL GRAIN AND MICROCHANNEL PRODUCTION APPARATUS FOR USE THEREIN SOKEN KAGAKU KK (JP) 2010-08-11 EP disclosed
EP-1296190-B1 Positive resist composition FUJIFILM CORP (JP) 2010-05-05 EP disclosed
US-7579131-B2 Positive resist composition and method of forming resist pattern using the same FUJIFILM CORPORATION (JP) 2009-08-25 US disclosed
US-7527829-B2 Fluid colloid crystal and process for producing three-dimensional aligned particle mass therefrom SOKEN CHEMICAL & ENGINEERING CO., LTD. (JP) 2009-05-05 US disclosed
EP-1367439-A1 Radiation-sensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2003-12-03 EP disclosed
US-20030203308-A1 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. 2003-10-30 US disclosed
US-20030134225-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2003-07-17 US disclosed
US-20030077543-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2003-04-24 US disclosed
EP-1296190-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. (JP) 2003-03-26 EP disclosed
US-6506535-B1 A positive working photoresist composition for use in the production of semiconductor integrated circuit devices, mask for the production of integrated circuits, printed wiring boards, liquid crystal panels FUJI PHOTO FILM CO., LTD. (JP) 2003-01-14 US disclosed
US-6479211-B1 FOR FAR ULTRAVIOLET EXPOSURE, WHICH CAN FORM A HIGHLY PRECISE PATTERN USING LIGHT IN THE FAR ULTRAVIOLET REGION INCLUDING AN EXCIMER LASER RAY, PARTICULARLY, IN THE REGION OF 250 NM OR LESS FUJI PHOTO FILM CO., LTD. (JP) 2002-11-12 US disclosed
EP-0788031-B1 Positive working photosensitive composition FUJI PHOTO FILM CO LTD (JP) 2000-10-18 EP disclosed
US-6013411-A PHOTOSENSITIVE COMPOSITION WITH HOMO OR COPOLYCARBONS, HALOGENIUM COMPOUNDS AND SULFONIUM COMPOUNDS FUJI PHOTO FILM CO., LTD. (JP) 2000-01-11 US disclosed
EP-0788031-A1 Positive working photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1997-08-06 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110318542-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition and Patterning Method Using Same FRG1, AFF2, AFF1 ZDHHC7 2089/4885TSHR 1374/4885HPGD 4398/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.