Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL5857326

CCOc1ccc([S+](C)C)cc1.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.47

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA12 O43570 1/20 0.47
▸ CA1 P00915 1/20 0.47
▸ CA2 P00918 1/20 0.47
▸ CA7 P43166 1/20 0.47
▸ CA9 Q16790 1/20 0.47
▸ ALDH1A1 P00352 2/20 0.44
▸ SMN1; SMN2 Q16637 1/20 0.44
▸ NQO1 P15559 1/20 0.44
▸ GAA P10253 2/20 0.40
▸ NPSR1 Q6W5P4 1/20 0.40
▸ POLB P06746 1/20 0.40
▸ PTPRZ1 P23471 1/20 0.40
▸ MAPK1 P28482 2/20 0.39
▸ LMNA P02545 1/20 0.39
▸ MEN1 O00255 1/20 0.39
▸ MAPT P10636 1/20 0.39
▸ KMT2A Q03164 1/20 0.39
▸ CYP1A2 P05177 1/20 0.39
▸ TDP1 Q9NUW8 2/20 0.38
▸ L3MBTL1 Q9Y468 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL5856344 0.88 CA12 (0.50) CA12CA1CA2CA7CA9
Trifluoromethanesulfonic Acid SCHEMBL5856405 0.86 CA12 (0.46) CA12CA1CA2CA7CA9
SCHEMBL5858667 0.86 CA1 (0.41) CA12CA1CA2CA7CA9
SCHEMBL5856271 0.85 CA1 (0.40) CA12CA1CA2CA7CA9
Trifluoromethanesulfonic Acid SCHEMBL5146818 0.82 KCNH2 (0.46) CA12CA1CA2CA7CA9
Trifluoromethanesulfonic Acid SCHEMBL30536267 0.81 KIF11 (0.43) ALDH1A1SMN1; SMN2MAPK1
Trifluoromethanesulfonic Acid SCHEMBL30418204 0.77 PPARA (0.54) ALDH1A1POLBCYP1A2TSHR
Trifluoromethanesulfonic Acid SCHEMBL4175814 0.77 MAPT (0.51) ALDH1A1SMN1; SMN2GAAPOLBLMNA
Trifluoromethanesulfonic Acid SCHEMBL11063718 0.77 CA12 (0.46) CA12CA1CA2CA7CA9
Trifluoromethanesulfonic Acid SCHEMBL31120910 0.77 CA12 (0.51) CA12CA1CA2CA7CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7078148-B2 Photoresist with improved sensitivity and resolution to deep ultraviolet rays/excimer lasers; semiconductors; integrated circuits JSR CORPORATION (JP) 2006-07-18 — — US disclosed
US-20040072094-A1 Radiation sensitive resin composition JSR CORPORATION (JP) 2004-04-15 — — US disclosed
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