SCHEMBL5857348

SCHEMBL5857348

CCOc1ccc([S+](c2ccccc2)c2ccccc2)cc1.O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 1/20 0.40
▸ MAPT P10636 1/20 0.40
▸ KMT2A Q03164 1/20 0.40
▸ CA12 O43570 1/20 0.38
▸ CA1 P00915 1/20 0.38
▸ CA2 P00918 1/20 0.38
▸ CA7 P43166 1/20 0.38
▸ CA9 Q16790 1/20 0.38
▸ LTA4H P09960 1/20 0.37
▸ GAA P10253 3/20 0.36
▸ L3MBTL1 Q9Y468 2/20 0.36
▸ MAPK1 P28482 1/20 0.36
▸ TDP1 Q9NUW8 1/20 0.36
▸ SQSTM1 Q13501 1/20 0.36
▸ KEAP1 Q14145 1/20 0.36
▸ NFE2L2 Q16236 1/20 0.36
▸ ALDH1A1 P00352 4/20 0.36
▸ CNR2 P34972 1/20 0.36
▸ SMN1; SMN2 Q16637 1/20 0.35
▸ NPSR1 Q6W5P4 3/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5856176 0.99 MEN1 (0.40) MEN1MAPTKMT2ACA12CA1
SCHEMBL5855981 0.95 CA1 (0.41) MEN1MAPTKMT2ACA12CA1
SCHEMBL5855868 0.94 CA1 (0.42) MEN1MAPTKMT2ACA12CA1
SCHEMBL3126062 0.91 TSHR (0.40) CA12CA1CA2CA7CA9
SCHEMBL3130567 0.91 TSHR (0.40) CA12CA1CA2CA7CA9
SCHEMBL3104515 0.89 TSHR (0.41) CA12CA1CA2CA7CA9
SCHEMBL3144464 0.86 GAA (0.37) KMT2ACA1CA2GAASQSTM1
SCHEMBL1088919 0.86 GAA (0.37) KMT2ACA1CA2GAASQSTM1
SCHEMBL3132695 0.86 GAA (0.37) KMT2ACA1CA2GAASQSTM1
SCHEMBL5856271 0.86 CA1 (0.40) MEN1MAPTKMT2ACA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7078148-B2 Photoresist with improved sensitivity and resolution to deep ultraviolet rays/excimer lasers; semiconductors; integrated circuits JSR CORPORATION (JP) 2006-07-18 — — US disclosed
US-20040072094-A1 Radiation sensitive resin composition JSR CORPORATION (JP) 2004-04-15 — — US disclosed
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