SCHEMBL5862973

SCHEMBL5862973

CCCCCCOc1ccc(C(C)(C)C)cc1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)c1ccc(C)cc1C

nearest known ligand 0.40

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.40
KDM4E B2RXH2 2/20 0.36
RECQL P46063 1/20 0.36
NR1I2 O75469 3/20 0.36
THRB P10828 3/20 0.36
THRA P10827 2/20 0.36
S1PR3 Q99500 1/20 0.35
ALDH1A1 P00352 3/20 0.35
NPSR1 Q6W5P4 2/20 0.35
TRPV1 Q8NER1 1/20 0.35
HSD17B10 Q99714 1/20 0.35
POLB P06746 2/20 0.34
GAA P10253 1/20 0.34
MAPT P10636 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5861629 0.99 ESR1 (0.38) ESR1KDM4ERECQLNR1I2THRB
SCHEMBL5862502 0.96 NR1I2 (0.39) ESR1KDM4ERECQLNR1I2ALDH1A1
SCHEMBL5862516 0.92 POLB (0.40) ESR1KDM4ETHRBTHRAS1PR3
SCHEMBL5863001 0.91 POLB (0.40) ESR1KDM4ETHRBTHRAS1PR3
SCHEMBL5862968 0.91 ESR1 (0.41) ESR1KDM4ENR1I2THRBTHRA
SCHEMBL5862347 0.91 ESR1 (0.41) ESR1KDM4ENR1I2THRBTHRA
SCHEMBL5861729 0.91 ESR1 (0.41) ESR1KDM4ENR1I2THRBTHRA
SCHEMBL5861568 0.91 ESR1 (0.41) ESR1KDM4ENR1I2THRBTHRA
SCHEMBL5862000 0.90 ALDH1A1 (0.41) ESR1KDM4ERECQLTHRBTHRA
SCHEMBL5862524 0.88 POLB (0.39) ESR1KDM4EALDH1A1HSD17B10POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7109311-B2 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-09-19 US disclosed
US-20040167322-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-08-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040167322-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process POLL, VEGFA, PIM3 ESR1 448/4885KDM4E 1704/4885RECQL 4028/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.