Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.38 |
| ▸ | LMNA | P02545 | 3/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | DNM1 | Q05193 | 3/20 | 0.36 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | CA12 | O43570 | 3/20 | 0.35 |
| ▸ | CA1 | P00915 | 3/20 | 0.35 |
| ▸ | CA9 | Q16790 | 3/20 | 0.35 |
| ▸ | ALDH2 | P05091 | 1/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | MMP1 | P03956 | 1/20 | 0.32 |
| ▸ | MMP2 | P08253 | 1/20 | 0.32 |
| ▸ | MMP3 | P08254 | 1/20 | 0.32 |
| ▸ | MMP8 | P22894 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | CES2 | O00748 | 1/20 | 0.30 |
| ▸ | CES1 | P23141 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7771822 | 0.90 | DNM1 (0.48) | TSHRLMNAALDH1A1DNM1THRB | |
| SCHEMBL6564545 | 0.88 | DNM1 (0.52) | TSHRLMNAALDH1A1DNM1THRB | |
| SCHEMBL6562380 | 0.88 | DNM1 (0.52) | TSHRLMNAALDH1A1DNM1THRB | |
| SCHEMBL6566069 | 0.88 | DNM1 (0.52) | TSHRLMNAALDH1A1DNM1THRB | |
| SCHEMBL8598289 | 0.75 | TSHR (0.33) | TSHRLMNAALDH1A1DNM1THRB | |
| SCHEMBL8597452 | 0.75 | TSHR (0.33) | TSHRLMNAALDH1A1DNM1THRB | |
| SCHEMBL1906418 | 0.75 | TSHR (0.33) | TSHRLMNAALDH1A1DNM1THRB | |
| SCHEMBL6562598 | 0.71 | DNM1 (0.31) | TSHRLMNAALDH1A1DNM1CA12 | |
| SCHEMBL8135589 | 0.69 | — | — | |
| SCHEMBL20212033 | 0.67 | TSHR (0.46) | TSHRLMNAALDH1A1DNM1THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6602783-B1 | Enhancing chemical vapor deposition of titanium nitride from tetrakis(dialkylamino)titanium and ammonia; removing hydro-carbon impurities; adding small amount of such as dipropyl-amine | AIR PRODUCTS AND CHEMICALS, INC. | 2003-08-05 | — | — | US | claimed |
| US-20030072883-A1 | Deposition of titanium amides | VERSUM MATERIALS US, LLC | 2003-04-17 | — | — | US | claimed |
| EP-1091018-A1 | Purification, analysis and deposition of titanium amides | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2001-04-11 | — | — | EP | claimed |
| EP-0509233-B1 | Process for producing ethylene-alpha-olefin copolymers | SUMITOMO CHEMICAL CO (JP) | 1995-11-08 | — | — | EP | claimed |
| US-5258476-A | HEATING ETHYLENE AND AN ALPHA-OLEFIN IN THE PRESENCE OF A POLYMERIZATION CATALYST MIXTURE OF A TITANIUM AMIDE AND AN OXYGEN CONTAINING ALKYLALUMINUM COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1993-11-02 | — | — | US | claimed |
| EP-0509233-A2 | Process for producing ethylene-alpha-olefin copolymers | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-10-21 | — | — | EP | claimed |
| US-20250279287-A1 | METAL OXIDE FILM AND METAL FILM LINER COMBINATION IN A SEMICONDUCTOR STRUCTURE, RELATED DEVICES, RELATED SYSTEMS, AND RELATED METHODS | ASM IP HOLDING B.V. (NL) | 2025-09-04 | — | — | US | disclosed |
| US-7009298-B2 | Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer | MICRON TECHNOLOGY, INC. (US) | 2006-03-07 | — | — | US | disclosed |
| US-6953743-B2 | Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer | MICRON TECHNOLOGY, INC. (US) | 2005-10-11 | — | — | US | disclosed |
| US-6930039-B2 | Method of fabricating a contact structure having a composite barrier layer between a platinum layer and a polysilicon plug | MICRON TECHNOLOGY, INC. (US) | 2005-08-16 | — | — | US | disclosed |
| US-6903010-B2 | Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer | MICRON TECHNOLOGY, INC. (US) | 2005-06-07 | — | — | US | disclosed |
| US-6881667-B2 | Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer | MICRON TECHNOLOGY, INC. (US) | 2005-04-19 | — | — | US | disclosed |
| US-6861351-B2 | Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer | MICRON TECHNOLOGY, INC. (US) | 2005-03-01 | — | — | US | disclosed |
| US-5258224-A | Preceramic composition and ceramic product | ETHYL CORPORATION (US) | 1993-11-02 | — | — | US | disclosed |
| US-5258476-A | HEATING ETHYLENE AND AN ALPHA-OLEFIN IN THE PRESENCE OF A POLYMERIZATION CATALYST MIXTURE OF A TITANIUM AMIDE AND AN OXYGEN CONTAINING ALKYLALUMINUM COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1993-11-02 | — | — | US | disclosed |
| US-5258229-A | Preceramic composition and ceramic product | ETHYL CORPORATION (US) | 1993-11-02 | — | — | US | disclosed |
| US-5246881-A | Low-pressure chemical vapor deposition process for depositing high-density, highly-conformal, titanium nitride films of low bulk resistivity | MICRON SEMICONDUCTOR, INC. (US) | 1993-09-21 | — | — | US | disclosed |
| US-5209979-A | Silicon carbide coated article with ceramic topcoat | ETHYL CORPORATION (US) | 1993-05-11 | — | — | US | disclosed |
| US-5208284-A | Coating composition | ETHYL CORPORATION (US) | 1993-05-04 | — | — | US | disclosed |
| EP-0509233-A2 | Process for producing ethylene-alpha-olefin copolymers | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-10-21 | — | — | EP | disclosed |