⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4442954 | 0.69 | CA4 (0.46) | — | |
| SCHEMBL74571 | 0.65 | — | — | |
| Anisole SCHEMBL2493788 | 0.65 | CA4 (1.00) | — | |
| Anisole SCHEMBL1205 | 0.65 | — | — | |
| Anisole SCHEMBL20328417 | 0.65 | — | — | |
| Anisole SCHEMBL8472521 | 0.65 | CA4 (1.00) | — | |
| Anisole SCHEMBL10721106 | 0.65 | CA4 (1.00) | — | |
| Anisole SCHEMBL30601749 | 0.65 | — | — | |
| Anisole SCHEMBL28813915 | 0.65 | CA4 (1.00) | — | |
| SCHEMBL142660 | 0.63 | ALDH1A1 (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7035518-B2 | Polymer waveguides and process for producing the same | HITACHI CABLE, LTD. (JP) | 2006-04-25 | — | — | US | disclosed |
| US-6909818-B2 | Optoelectronic packaging substrate and production method of the same | NIPPON PAINT CO., LTD. (JP) | 2005-06-21 | — | — | US | disclosed |
| US-6830818-B2 | Silicone compound added to branched polysilane compound; highly reliable polymer material and polymer film, heat resistrance, resolution | HITACHI CABLE, LTD. (JP) | 2004-12-14 | — | — | US | disclosed |
| US-20040125544-A1 | Solid electrolyte and capacitor element using the same | NIPPON PAINT CO., LTD. | 2004-07-01 | — | — | US | disclosed |
| US-20040005109-A1 | Optoelectronic packaging substrate and production method of the same | NIPPON PAINT & CO., LTD. (JP) | 2004-01-08 | — | — | US | disclosed |
| US-20030232286-A1 | Method for forming metal colloid patterns | NIPPON PAINT CO., LTD. | 2003-12-18 | — | — | US | disclosed |
| US-20020177660-A1 | Polymer material and polymer film | HITACHI CABLE, LTD. AND NIPPON PAINT CO., LTD. | 2002-11-28 | — | — | US | disclosed |
| US-20020150368-A1 | Polymer waveguides and process for producing the same | HITACHI CABLE, LTD. | 2002-10-17 | — | — | US | disclosed |
| EP-0725315-B1 | Photosensitive resin composition and method for forming pattern using the same | NIPPON PAINT CO LTD (JP) | 2001-05-02 | — | — | EP | disclosed |
| EP-0725315-A2 | Photosensitive resin composition and method for forming pattern using the same | Nippon Paint Co., Ltd. (JP) | 1996-08-07 | — | — | EP | disclosed |