⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1556509 | 0.67 | — | — | |
| SCHEMBL7267443 | 0.63 | — | — | |
| SCHEMBL5531431 | 0.63 | — | — | |
| SCHEMBL9801925 | 0.63 | — | — | |
| SCHEMBL14944041 | 0.63 | — | — | |
| Methoxymethane SCHEMBL868 | 0.57 | — | — | |
| Methoxymethane SCHEMBL16998540 | 0.57 | — | — | |
| Methoxymethane SCHEMBL5707121 | 0.57 | — | — | |
| Methoxymethane SCHEMBL12190176 | 0.57 | — | — | |
| SCHEMBL23662713 | 0.54 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118930577-A | Ultrapure octamethyl Cyclotetrasiloxanes preparation method of tetramethyl cyclotetrasiloxane | 浙江理工大学绍兴柯桥研究院有限公司 | 2024-11-12 | — | — | CN | claimed |
| CN-104010505-A | Pesticidal compositions and methods related thereto | DOW AGROSCIENCES LLC | 2014-08-27 | — | — | CN | claimed |
| CN-118930577-A | Ultrapure octamethyl Cyclotetrasiloxanes preparation method of tetramethyl cyclotetrasiloxane | 浙江理工大学绍兴柯桥研究院有限公司 | 2024-11-12 | — | — | CN | disclosed |
| CN-104024225-A | Pesticidal compounds | SYNGENTA PARTICIPATIONS AG | 2014-09-03 | — | — | CN | disclosed |
| US-7106937-B2 | Optical waveguide and method of fabricating the same | TDK CORPORATION (JP) | 2006-09-12 | — | — | US | disclosed |
| US-20060193584-A1 | Optical waveguide and method of fabricating the same | TDK CORPORATION (JP) | 2006-08-31 | — | — | US | disclosed |
| US-7027702-B2 | Optical waveguide | TDK CORPORATION (JP) | 2006-04-11 | — | — | US | disclosed |
| EP-1560046-A1 | Optical waveguide and method of fabricating the same | TDK Corporation (JP) | 2005-08-03 | — | — | EP | disclosed |
| US-20050163445-A1 | Optical waveguide and method of fabricating the same | TDK CORPORATION (JP) | 2005-07-28 | — | — | US | disclosed |
| US-20050013574-A1 | Optical waveguide | TDK CORPORATION (JP) | 2005-01-20 | — | — | US | disclosed |
| US-20040184756-A1 | Method of manufacturing optical waveguide and the optical waveguide | TDK CORPORATION (JP) | 2004-09-23 | — | — | US | disclosed |
| EP-0538874-B1 | Method and apparatus for manufacturing semiconductor devices | F T L CO LTD (JP) | 1999-03-31 | — | — | EP | disclosed |
| US-5643839-A | Method for producing semiconductor device | F.T.L. CO., LTD. (JP) | 1997-07-01 | — | — | US | disclosed |
| US-5445676-A | Method and apparatus for manufacturing semiconductor devices | F.T.L. CO., LTD. (JP) | 1995-08-29 | — | — | US | disclosed |
| US-5387557-A | Method for manufacturing semiconductor devices using heat-treatment vertical reactor with temperature zones | F. T. L. CO., LTD. (JP) | 1995-02-07 | — | — | US | disclosed |
| EP-0538874-A1 | Method and apparatus for manufacturing semiconductor devices | F.T.L. Co., Ltd. (JP) | 1993-04-28 | — | — | EP | disclosed |