⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL5949280 | 0.95 | — | — | |
| SCHEMBL6743104 | 0.83 | — | — | |
| SCHEMBL6933051 | 0.74 | — | — | |
| SCHEMBL1556509 | 0.71 | — | — | |
| SCHEMBL5077203 | 0.63 | — | — | |
| SCHEMBL2570805 | 0.63 | — | — | |
| SCHEMBL18321826 | 0.63 | — | — | |
| SCHEMBL5873333 | 0.63 | — | — | |
| SCHEMBL9577551 | 0.60 | — | — | |
| SCHEMBL23133186 | 0.58 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117645703-A | Reactive phosphorus-containing flame retardant, synthesis and application thereof | 赫德瑞意(上海)新材料有限公司 | 2024-03-05 | — | — | CN | claimed |
| US-20030021578-A1 | GeBPSG top clad for a planar lightwave circuit | NEOPHOTONICS CORPORATION | 2003-01-30 | — | — | US | claimed |
| CN-117645703-A | Reactive phosphorus-containing flame retardant, synthesis and application thereof | 赫德瑞意(上海)新材料有限公司 | 2024-03-05 | — | — | CN | disclosed |
| CN-115304762-B | Preparation method and application of reactive halogen-free flame-retardant polyether polyol | 山东一诺威新材料有限公司 | 2023-12-29 | — | — | CN | disclosed |
| US-20160289796-A1 | USE OF AN ORGANIC-INORGANIC HYBRID MATERIAL FOR EXTRACTING URANIUM(VI) FROM A SULFURIC ACID AQUEOUS SOLUTION, ISSUED NOTABLY FROM THE SULFURIC LEACHING OF A URANIUM-BEARING ORE | COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES (FR) | 2016-10-06 | — | — | US | disclosed |
| US-20160016150-A1 | ORGANIC-INORGANIC HYBRID MATERIAL OF USE FOR EXTRACTING URANIUM (VI) FROM AQUEOUS MEDIA CONTAINING PHOSPHORIC ACID, PROCESSES FOR PREPARING SAME AND USES THEREOF | UNIVERSITÉ DE MONTPELLIER (FR) | 2016-01-21 | — | — | US | disclosed |
| US-20160016150-A1 | ORGANIC-INORGANIC HYBRID MATERIAL OF USE FOR EXTRACTING URANIUM (VI) FROM AQUEOUS MEDIA CONTAINING PHOSPHORIC ACID, PROCESSES FOR PREPARING SAME AND USES THEREOF | UNIVERSITÉ DE MONTPELLIER (FR) | 2016-01-21 | — | — | US | disclosed |
| US-8481421-B2 | Functional anchors connecting graphene-like carbon to metal | CALIFORNIA INSTITUTE OF TECHNOLOGY (US) | 2013-07-09 | — | — | US | disclosed |
| US-20090029221-A1 | FUNCTIONAL ANCHORS CONNECTING GRAPHENE-LIKE CARBON TO METAL | NATIONAL SCIENCE FOUNDATION | 2009-01-29 | — | — | US | disclosed |
| US-6187216-B1 | Method for etching a dielectric layer over a semiconductor substrate | MOTOROLA, INC. | 2001-02-13 | — | — | US | disclosed |
| US-6167834-B1 | Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process | APPLIED MATERIALS, INC. | 2001-01-02 | — | — | US | disclosed |
| EP-0272140-B1 | TEOS based plasma enhanced chemical vapor deposition process for deposition of silicon dioxide films. | APPLIED MATERIALS INC (US) | 1994-02-23 | — | — | EP | disclosed |
| US-5000113-A | Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process | APPLIED MATERIALS, INC. (US) | 1991-03-19 | — | — | US | disclosed |
| US-4960488-A | TWO STEP CONTINUOUS ETCH SEQUENCE IS USED IN WHICH THE FIRST STEP USES HIGH PRESSURE, ETCHING WITH FLUOROCARBON GAS AND THE SECOND STEP USES LOWER PRESSURE, ETCHING WITH FLUORINATED GAS | APPLIED MATERIALS, INC. (US) | 1990-10-02 | — | — | US | disclosed |
| US-4892753-A | PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION, DECOMPOSITION OF TETRAETHYL SILICATE | APPLIED MATERIALS, INC. (US) | 1990-01-09 | — | — | US | disclosed |
| US-4872947-A | CVD of silicon oxide using TEOS decomposition and in-situ planarization process | APPLIED MATERIALS, INC. (US) | 1989-10-10 | — | — | US | disclosed |
| EP-0296891-A2 | Process for self-cleaning of a reactor chamber | APPLIED MATERIALS, INC. (US) | 1988-12-28 | — | — | EP | disclosed |
| EP-0272140-A2 | TEOS based plasma enhanced chemical vapor deposition process for deposition of silicon dioxide films. | APPLIED MATERIALS, INC. (US) | 1988-06-22 | — | — | EP | disclosed |
| US-4501685-A | PALLADIUM ON CARBON BLACK SUPPORT POISONED BY NITROGEN, PHOSPHORUS, OR SULFUR COMPOUND | JOHNSON MATTHEY PUBLIC LIMITED COMPANY (GB) | 1985-02-26 | — | — | US | disclosed |
| US-3941783-A | Process for the production of N,N-disubstituted carboxylic amides | ESZAKMAGYARORSZAGI VEGYIMUVEK (HU) | 1976-03-02 | — | — | US | disclosed |