Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Lithium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Zinc Ion SCHEMBL27364527 | 0.93 | TSHR (0.38) | — | |
| Potassium Ion SCHEMBL9570806 | 0.93 | — | — | |
| SCHEMBL10632023 | 0.93 | TSHR (0.38) | — | |
| SCHEMBL864082 | 0.93 | TSHR (0.38) | — | |
| SCHEMBL8209313 | 0.93 | TSHR (0.38) | — | |
| SCHEMBL13571101 | 0.93 | TSHR (0.38) | — | |
| SCHEMBL8596831 | 0.93 | — | — | |
| SCHEMBL6301707 | 0.87 | TSHR (0.38) | — | |
| SCHEMBL5074437 | 0.73 | DNM1 (0.41) | — | |
| SCHEMBL5072491 | 0.73 | DNM1 (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2754638-B1 | FILM-FORMING MATERIAL, GROUP IV METAL OXIDE FILM AND VINYLENE DIAMIDE COMPLEX | TOSOH CORP (JP) | 2018-11-07 | — | — | EP | disclosed |
| US-9371452-B2 | Film-forming material, group IV metal oxide film and vinylenediamide complex | TOSOH CORPORATION (JP) | 2016-06-21 | — | — | US | disclosed |
| US-20140227456-A1 | FILM-FORMING MATERIAL, GROUP IV METAL OXIDE FILM AND VINYLENEDIAMIDE COMPLEX | SAGAMI CHEMICAL RESEARCH INSTITUTE (JP) | 2014-08-14 | — | — | US | disclosed |
| CN-103917487-A | Film-forming material, group IV metal oxide film, and vinylidene diamide complex | TOSOH CORP | 2014-07-09 | — | — | CN | disclosed |
| US-6982312-B2 | Process for producing polyarylene sulfide | IDEMITSU KOSAN CO., LTD. (JP) | 2006-01-03 | — | — | US | disclosed |
| US-20040092706-A1 | Process for producing polyarylene sulfide | IDEMITSU KOSAN CO. LTD. (JP) | 2004-05-13 | — | — | US | disclosed |
| EP-1375541-A1 | PROCESS FOR PRODUCING POLYARYLENE SULFIDE | IDEMITSU PETROCHEMICAL CO., LTD. (JP) | 2004-01-02 | — | — | EP | disclosed |