Gallic Acid

Gallic Acid

SCHEMBL5874545

CN.O=C(O)c1cc(O)c(O)c(O)c1

nearest known ligand 0.85

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.85
CA12 O43570 4/20 0.85
CA1 P00915 4/20 0.85
CA2 P00918 4/20 0.85
CA7 P43166 4/20 0.85
CA9 Q16790 4/20 0.85
CA14 Q9ULX7 4/20 0.85
LMNA P02545 3/20 0.85
TDP1 Q9NUW8 3/20 0.85
MAPT P10636 3/20 0.85
CA4 P22748 3/20 0.85
CA6 P23280 3/20 0.85
ALDH1A1 P00352 2/20 0.85
FUT7 Q11130 2/20 0.85
CA3 P07451 2/20 0.85
CA5A P35218 2/20 0.85
CA5B Q9Y2D0 2/20 0.85
TP53 P04637 1/20 0.85
SELL P14151 1/20 0.85
HPGD P15428 1/20 0.85

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Gallic Acid SCHEMBL1325555 0.92 KDM4E (0.90) KDM4ECA12CA1CA2CA7
Gallic Acid SCHEMBL27648549 0.92 CA12 (0.90) KDM4ECA12CA1CA2CA7
Gallic Acid SCHEMBL2726519 0.92 CA12 (0.90) KDM4ECA12CA1CA2CA7
Gallic Acid SCHEMBL15012 0.92 CA12 (1.00) KDM4ECA12CA1CA2CA7
Gallic Acid SCHEMBL29484566 0.92 CA12 (1.00) KDM4ECA12CA1CA2CA7
Gallic Acid SCHEMBL30375631 0.92 CA12 (1.00) KDM4ECA12CA1CA2CA7
Gallic Acid SCHEMBL4918056 0.92 CA12 (1.00) KDM4ECA12CA1CA2CA7
Gallic Acid SCHEMBL8088102 0.92 CA12 (1.00) KDM4ECA12CA1CA2CA7
Gallic Acid SCHEMBL678990 0.92 CA12 (1.00) KDM4ECA12CA1CA2CA7
Gallic Acid SCHEMBL1845406 0.92 CA12 (1.00) KDM4ECA12CA1CA2CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed