Sebacic Acid

Sebacic Acid

SCHEMBL5874634

CCN(CC)CC.CCN(CC)CC.O=C(O)CCCCCCCCC(=O)O

nearest known ligand 0.64

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GPR84 Q9NQS5 8/20 0.64
PPARG P37231 7/20 0.64
PPARD Q03181 7/20 0.64
PPARA Q07869 7/20 0.64
HDAC11 Q96DB2 5/20 0.64
TSHR P16473 5/20 0.64
PTPN1 P18031 3/20 0.64
ALDH1A1 P00352 2/20 0.64
TLR2 O60603 2/20 0.64
TDP1 Q9NUW8 2/20 0.64
FABP4 P15090 2/20 0.64
KMT2A Q03164 2/20 0.64
FFAR1 O14842 2/20 0.64
FFAR4 Q5NUL3 2/20 0.64
SLC22A6 Q4U2R8 1/20 0.64
SLC22A8 Q8TCC7 1/20 0.64
MEN1 O00255 1/20 0.64
ESR1 P03372 1/20 0.64
ALOX15 P16050 1/20 0.64
PDE4A P27815 1/20 0.64

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Sebacic Acid SCHEMBL5874637 1.00 GPR84 (0.64) GPR84PPARGPPARDPPARAHDAC11
SCHEMBL10891070 1.00 GPR84 (0.64) GPR84PPARGPPARDPPARAHDAC11
SCHEMBL10891072 1.00 GPR84 (0.64) GPR84PPARGPPARDPPARAHDAC11
Azelaic Acid SCHEMBL17140336 1.00 GPR84 (0.64) GPR84PPARGPPARDPPARAHDAC11
Adipic Acid SCHEMBL5875018 0.97 AKR1B1 (0.62) GPR84PPARGPPARDPPARAHDAC11
Adipic Acid SCHEMBL5875010 0.97 AKR1B1 (0.62) GPR84PPARGPPARDPPARAHDAC11
Heptanoate SCHEMBL3410001 0.93 GPR84 (0.77) GPR84PPARGPPARDPPARAHDAC11
Octanoic Acid SCHEMBL3414554 0.93 GPR84 (0.77) GPR84PPARGPPARDPPARAHDAC11
Undecanoate SCHEMBL21145218 0.93 GPR84 (0.77) GPR84PPARGPPARDPPARAHDAC11
Octanoic Acid SCHEMBL3412884 0.93 GPR84 (0.77) GPR84PPARGPPARDPPARAHDAC11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed