Trichloroacetic Acid

Trichloroacetic Acid

SCHEMBL5874964

CCN.O=C(O)C(Cl)(Cl)Cl

nearest known ligand 0.62

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.62
ALDH1A1 P00352 3/20 0.62
TP53 P04637 1/20 0.62
FFAR3 O14843 2/20 0.37
GLRA1 P23415 1/20 0.37
SLC6A9 P48067 1/20 0.37
OR51E2 Q9H255 1/20 0.37
MEN1 O00255 1/20 0.36
CYP1A2 P05177 1/20 0.36
THRB P10828 1/20 0.36
KMT2A Q03164 1/20 0.36
FDPS P14324 3/20 0.35
KDM4E B2RXH2 1/20 0.35
CYP2D6 P10635 1/20 0.33
CYP2C19 P33261 1/20 0.33
HIF1A Q16665 1/20 0.33
HDAC3 O15379 1/20 0.32
HDAC1 Q13547 1/20 0.32
HDAC2 Q92769 1/20 0.32
HDAC8 Q9BY41 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trichloroacetic Acid SCHEMBL2699210 0.84 ALDH1A1 (0.67) TSHRALDH1A1TP53FFAR3MEN1
Trichloroacetic Acid SCHEMBL8331735 0.84 TSHR (0.67) TSHRALDH1A1TP53GLRA1SLC6A9
Trichloroacetic Acid SCHEMBL5875229 0.83
Trichloroacetic Acid SCHEMBL3784104 0.81 TSHR (0.62) TSHRALDH1A1TP53GLRA1SLC6A9
Trichloroacetic Acid SCHEMBL8995195 0.79
Trichloroacetic Acid SCHEMBL1331955 0.79
Trichloroacetic Acid SCHEMBL10493657 0.79 TSHR (1.00) TSHRALDH1A1TP53FFAR3CYP1A2
Trichloroacetic Acid SCHEMBL10745837 0.79
Trichloroacetic Acid SCHEMBL38661501 0.79
Trichloroacetic Acid SCHEMBL3220 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed