Phthalic Acid

Phthalic Acid

SCHEMBL5875366

CN(C)C.O=C(O)c1ccccc1C(=O)O

nearest known ligand 0.78

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.78
ALOX15 P16050 1/20 0.78
AKR1C3 P42330 2/20 0.58
CA12 O43570 3/20 0.56
CA1 P00915 3/20 0.56
CA2 P00918 3/20 0.56
CA4 P22748 3/20 0.56
CA7 P43166 3/20 0.56
CA9 Q16790 3/20 0.56
KDM4E B2RXH2 2/20 0.56
HMGB1 P09429 2/20 0.56
HPGD P15428 2/20 0.56
NAPRT Q6XQN6 2/20 0.56
CA6 P23280 1/20 0.56
SMN1; SMN2 Q16637 1/20 0.56
CA14 Q9ULX7 1/20 0.56
MAPT P10636 1/20 0.54
HDAC8 Q9BY41 1/20 0.54
MYC P01106 3/20 0.54
NR4A1 P22736 2/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phthalic Acid SCHEMBL5875361 1.00 ALDH1A1 (0.78) ALDH1A1ALOX15AKR1C3CA12CA1
Phthalic Acid SCHEMBL11771802 1.00 ALDH1A1 (0.78) ALDH1A1ALOX15AKR1C3CA12CA1
Phthalic Acid SCHEMBL28080325 0.91 ALDH1A1 (0.64) ALDH1A1ALOX15AKR1C3CA12CA1
Phthalic Acid SCHEMBL27470430 0.88 ALDH1A1 (0.88) ALDH1A1ALOX15AKR1C3CA12CA1
Phthalic Acid SCHEMBL4396104 0.88 ALDH1A1 (0.88) ALDH1A1ALOX15AKR1C3CA12CA1
Phthalic Acid SCHEMBL30575217 0.88 ALDH1A1 (0.88) ALDH1A1ALOX15AKR1C3CA12CA1
Phthalic Acid SCHEMBL4797005 0.88 ALDH1A1 (0.88) ALDH1A1ALOX15AKR1C3CA12CA1
Phthalic Acid SCHEMBL10477086 0.88 ALDH1A1 (1.00) ALDH1A1ALOX15AKR1C3CA12CA1
Phthalic Acid SCHEMBL1808 0.88 ALDH1A1 (1.00) ALDH1A1ALOX15AKR1C3CA12CA1
Phthalic Acid SCHEMBL1332278 0.88 ALDH1A1 (1.00) ALDH1A1ALOX15AKR1C3CA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106444280-B Negative-type photosensitive resin composition 东友精细化工有限公司 2019-10-11 CN claimed
CN-108602906-A Electroactive hydrophilic biopolymer 超电介质有限公司 2018-09-28 CN claimed
CN-107219724-A Chemical amplification positive photonasty organic insulating film resin combination and dielectric film 东友精细化工有限公司 2017-09-29 CN claimed
CN-106444280-A Negative-type photosensitive resin comopsition 东友精细化工有限公司 2017-02-22 CN claimed
CN-104449481-B Adhesive composition and surface protection film 藤森工业株式会社 2016-08-31 CN claimed
US-20250174409-A1 SOLID ELECTROLYTE CAPACITOR AND METHOD FOR MANUFACTURING SAME CARLIT CO., LTD. (JP) 2025-05-29 US disclosed
CN-112286000-B Composition for forming silicon-containing resist underlayer film and pattern forming method 信越化学工业株式会社 2024-12-03 CN disclosed
CN-111856882-B Composition for forming silicon-containing resist underlayer film and pattern forming method 信越化学工业株式会社 2024-11-29 CN disclosed
CN-118843914-A Solid electrolytic capacitor and method for manufacturing the same 佳里多股份公司 2024-10-25 CN disclosed
CN-114660896-B Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound 信越化学工业株式会社 2024-06-11 CN disclosed
CN-116804825-A Composition for forming silicon-containing metal hard mask and pattern forming method 信越化学工业株式会社 2023-09-26 CN disclosed
WO-2023171344-A1 SOLID ELECTROLYTE CAPACITOR AND METHOD FOR MANUFACTURING SAME カーリットホールディングス株式会社 2023-09-14 WO disclosed
CN-104053744-A Method of fracturing using ultra lightweight proppant suspensions and gaseous streams BAKER HUGHES INC 2014-09-17 CN disclosed
US-20120212880-A1 ELECTROLYTIC CAPACITOR AND METHOD OF MANUFACTURING ELECTROLYTIC CAPACITOR SAGA SANYO INDUSTRIES CO., LTD. (JP) 2012-08-23 US disclosed
CN-102646515-A Electrolytic capacitor and method of manufacturing electrolytic capacitor SAGA SANYO IND CO LTD 2012-08-22 CN disclosed
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-6962612-B1 Solid organic conductor is organic conductive polymer polymerized and bonded to surface of positive electrode; good impedance, small current leak, reliable, high dielectric strength. MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2005-11-08 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed
US-6307735-B1 Electrolytic capacitor and its manufacturing method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2001-10-23 US disclosed
EP-0938108-A2 Electrolytic capacitor and its manufacturing method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1999-08-25 EP disclosed