Sebacic Acid

Sebacic Acid

SCHEMBL5875432

O=C(O)CCCCCCCCC(=O)O.OCCON(OCCO)OCCO

nearest known ligand 0.56

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GPR84 Q9NQS5 8/20 0.56
FFAR1 O14842 2/20 0.56
FFAR4 Q5NUL3 2/20 0.56
TSHR P16473 5/20 0.52
LMNA P02545 3/20 0.52
NFKB1 P19838 1/20 0.52
PMP22 Q01453 1/20 0.52
ALDH1A1 P00352 4/20 0.48
CAMK2A Q9UQM7 1/20 0.48
PPARG P37231 6/20 0.43
PPARD Q03181 6/20 0.43
PPARA Q07869 6/20 0.43
HDAC11 Q96DB2 5/20 0.43
TLR2 O60603 2/20 0.43
TDP1 Q9NUW8 2/20 0.43
MEN1 O00255 2/20 0.43
FABP4 P15090 2/20 0.43
ALOX15 P16050 2/20 0.43
PTPN1 P18031 2/20 0.43
KMT2A Q03164 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Adipic Acid SCHEMBL5875305 0.98 GPR84 (0.52) GPR84FFAR1FFAR4TSHRLMNA
Glutarate SCHEMBL5874794 0.93 SLC22A6 (0.50) GPR84FFAR1FFAR4TSHRLMNA
Palmitic Acid SCHEMBL5712838 0.91 GPR84 (0.61) GPR84FFAR1FFAR4TSHRLMNA
Octanoic Acid SCHEMBL5874225 0.91 GPR84 (0.61) GPR84FFAR1FFAR4TSHRLMNA
Nonanoate SCHEMBL5874628 0.91 GPR84 (0.61) GPR84FFAR1FFAR4TSHRLMNA
Decanoic Acid SCHEMBL5874396 0.91 GPR84 (0.61) GPR84FFAR1FFAR4TSHRLMNA
Dodecanoate SCHEMBL3470118 0.91 GPR84 (0.61) GPR84FFAR1FFAR4TSHRLMNA
Heptanoate SCHEMBL5874736 0.91 GPR84 (0.61) GPR84FFAR1FFAR4TSHRLMNA
Myristic Acid SCHEMBL3469992 0.91 GPR84 (0.61) GPR84FFAR1FFAR4TSHRLMNA
Behenic Acid SCHEMBL15973561 0.91 GPR84 (0.61) GPR84FFAR1FFAR4TSHRLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed