⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1618065 | 0.70 | — | — | |
| Carbon Dioxide SCHEMBL22204693 | 0.67 | — | — | |
| SCHEMBL2466 | 0.67 | — | — | |
| SCHEMBL137007 | 0.67 | — | — | |
| SCHEMBL19810558 | 0.64 | — | — | |
| SCHEMBL7745891 | 0.64 | — | — | |
| SCHEMBL2835967 | 0.64 | — | — | |
| SCHEMBL8627911 | 0.64 | — | — | |
| SCHEMBL7161927 | 0.64 | — | — | |
| SCHEMBL2201803 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7105618-B2 | Fluorine-containing polymerizable monomers and polymers, anti-reflection film materials and resist compositions using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-09-12 | — | — | US | disclosed |
| US-20030232940-A1 | Fluorine-containing polymerizable monomers and polymers, anti-reflection film materials and resist compositions using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2003-12-18 | — | — | US | disclosed |
| US-6511787-B2 | Acrylic resin containing hexafluoroisopropanol units having high transmittance to ultraviolet radiation having high transparency, substrate adhesion, alkali development, and acid-elimination capability for lithographic microprocessing | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-01-28 | — | — | US | disclosed |
| US-20020048724-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-04-25 | — | — | US | disclosed |
| EP-0825167-B1 | COMPOUNDS AND SURFACTANTS | ASAHI DENKA KOGYO KK (JP) | 2001-10-04 | — | — | EP | disclosed |
| US-5929290-A | A HYDROPHILIC POLYETHER HAVING A FLUORO-SUBSTITUTED ALKYL END GROUP AND A (METH)ALLYL GLYCIDYL END GROUP; EMULSIFIERS AND DISPERSANTS FOR EMULSION AND SUSPENSION POLYMERIZATION, RESP.; RESIN REFORMING AGENTS; ANTISOILANTS FOR POLYESTERS | ASAHI DENKA KOGYO K. K. (JP) | 1999-07-27 | — | — | US | disclosed |
| EP-0825167-A1 | COMPOUNDS AND SURFACTANTS | ASAHI DENKA KOGYO KABUSHIKI KAISHA (JP) | 1998-02-25 | — | — | EP | disclosed |