SCHEMBL5881344

SCHEMBL5881344

C=CC[Si](CC)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5881391 0.93
Fluoride SCHEMBL27930932 0.90 TSHR (0.33)
SCHEMBL250774 0.78 TSHR (0.33)
SCHEMBL5881343 0.75 TSHR (0.38)
SCHEMBL5881428 0.75 TSHR (0.38)
Fluoride SCHEMBL27930930 0.74 TSHR (0.31)
SCHEMBL437975 0.69 TSHR (0.44)
SCHEMBL438728 0.69 TSHR (0.44)
SCHEMBL5881341 0.65
SCHEMBL215409 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6989420-B2 Coating liquid for producing insulating film having low dielectric constant SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-01-24 US disclosed
US-6914119-B2 Heat-resistant polyether, curable polyether, and coating liquid for forming a polyether film SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-07-05 US disclosed
US-20030130391-A1 Coating liquid for producing insulating film having low dielectric constant SUMITOMO CHEMICAL COMPANY, LIMITED 2003-07-10 US disclosed
US-20030060591-A1 Heat-resistant polyether, curable polyether, and coating liquid for forming a polyether film SUMITOMO CHEMICAL COMPANY, LIMITED 2003-03-27 US disclosed
US-6534595-B2 Blend of thermosetting resin, decomposable resin and solvent SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-03-18 US disclosed
US-20010038887-A1 Coating solution for forming porous organic film SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-11-08 US disclosed