SCHEMBL588205

SCHEMBL588205

CCCCCCCCCCCCCCCCCC[CH]O

nearest known ligand 0.52

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.52
THRB P10828 1/20 0.50
EP300 Q09472 1/20 0.46
FAAH O00519 2/20 0.46
TRPV1 Q8NER1 1/20 0.46
DNM1 Q05193 3/20 0.45
LMNA P02545 2/20 0.45
ALDH1A1 P00352 1/20 0.45
HSD17B10 Q99714 1/20 0.45
MEN1 O00255 1/20 0.45
KMT2A Q03164 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL588080 1.00 TSHR (0.52) TSHRTHRBEP300FAAHTRPV1
SCHEMBL3181791 1.00 TSHR (0.52) TSHRTHRBEP300FAAHTRPV1
SCHEMBL4755737 1.00 TSHR (0.52) TSHRTHRBEP300FAAHTRPV1
SCHEMBL548489 1.00 TSHR (0.52) TSHRTHRBEP300FAAHTRPV1
SCHEMBL4756812 1.00 TSHR (0.52) TSHRTHRBEP300FAAHTRPV1
SCHEMBL413361 1.00
SCHEMBL4755732 1.00 TSHR (0.52) TSHRTHRBEP300FAAHTRPV1
SCHEMBL4756755 1.00 TSHR (0.52) TSHRTHRBEP300FAAHTRPV1
SCHEMBL337456 1.00 TSHR (0.52) TSHRTHRBEP300FAAHTRPV1
SCHEMBL167574 1.00

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11904621-B2 Thermal transfer recording sheet CANON KABUSHIKI KAISHA (JP) 2024-02-20 US disclosed
CN-117242116-A Triazinyl ultraviolet absorbing polymers 巴斯夫欧洲公司 2023-12-15 CN disclosed
CN-110582726-B Positive photosensitive resin composition, thermal crosslinking agent for positive photosensitive resin, pattern cured film, method for producing pattern cured film, semiconductor element, and electronic device 株式会社力森诺科 2023-08-04 CN disclosed
WO-2023145476-A1 MICROPROCESSING TREATMENT AGENT AND MICROPROCESSING TREATMENT METHOD ステラケミファ株式会社 2023-08-03 WO disclosed
US-20230236508-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED FILM, PATTERNED CURED FILM AND SEMICONDUCTOR ELEMENT RESONAC CORPORATION (JP) 2023-07-27 US disclosed
CN-109923711-B Binder composition for lithium battery 富士胶片和光纯药株式会社 2023-06-27 CN disclosed
CN-109937500-B Binder composition for lithium battery electrode and electrode using same 富士胶片和光纯药株式会社 2023-04-11 CN disclosed
EP-4099090-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED FILM, PATTERNED CURED FILM AND SEMICONDUCTOR ELEMENT Showa Denko Materials Co., Ltd. (JP) 2022-12-07 EP disclosed
CN-115398339-A Photosensitive resin composition, method for producing patterned cured film, and semiconductor device 昭和电工材料株式会社 2022-11-25 CN disclosed
CN-114901645-A Triazine UV absorbent and preparation method thereof 巴斯夫欧洲公司 2022-08-12 CN disclosed
EP-0740651-B1 AMINE DERIVATIVE AND DETERGENT COMPOSITION CONTAINING THE SAME KAO CORP (JP) 1998-08-12 EP disclosed
US-5756784-A LATHERABILITY; EMULSION STABILITY KAO CORPORATION (JP) 1998-05-26 US disclosed
EP-0514588-B1 Novel phosphobetaine and detergent and cosmetic containing the same KAO CORP (JP) 1997-06-11 EP disclosed
EP-0740651-A1 AMINE DERIVATIVE AND DETERGENT COMPOSITION CONTAINING THE SAME Kao Corporation (JP) 1996-11-06 EP disclosed
WO-1995016664-A1 AMINE DERIVATIVE AND DETERGENT COMPOSITION CONTAINING THE SAME KAO CORPORATION (JP) 1995-06-22 WO disclosed
US-5409705-A Phosphobetaine and detergent and cosmetic containing the same KAO CORPORATION (JP) 1995-04-25 US disclosed
EP-0455018-B1 Pigment consisting of polyvalent metal salt of amidosulfonic acid and cosmetic composition containing the same KAO CORP (JP) 1994-09-07 EP disclosed
US-5167709-A Improved spreadability KAO CORPORATION (JP) 1992-12-01 US disclosed
EP-0514588-A2 Novel phosphobetaine and detergent and cosmetic containing the same Kao Corporation (JP) 1991-11-25 EP disclosed
EP-0455018-A1 Pigment consisting of polyvalent metal salt of amidosulfonic acid and cosmetic composition containing the same KAO CORPORATION (JP) 1991-11-06 EP disclosed