SCHEMBL5884672

SCHEMBL5884672

CC(=O)OCCCn1cnc2ccccc21

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 11/20 0.60
HTT P42858 5/20 0.60
LMNA P02545 5/20 0.58
ALOX15 P16050 1/20 0.58
TSHR P16473 1/20 0.58
MAPT P10636 5/20 0.58
NPC1 O15118 2/20 0.58
RAB9A P51151 2/20 0.58
NFKB1 P19838 1/20 0.58
NFKB2 Q00653 1/20 0.58
RELA Q04206 1/20 0.58
EGLN3 Q9H6Z9 1/20 0.57
TDP1 Q9NUW8 1/20 0.57
STAT3 P40763 1/20 0.56
KDM4E B2RXH2 2/20 0.56
ALDH1A1 P00352 2/20 0.56
PKM P14618 1/20 0.56
STAT1 P42224 1/20 0.56
MEN1 O00255 2/20 0.55
KMT2A Q03164 2/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL502049 0.92 SMN1; SMN2 (0.66) SMN1; SMN2HTTLMNAALOX15TSHR
SCHEMBL28235209 0.82 EGLN3 (0.55) SMN1; SMN2HTTLMNAMAPTNPC1
SCHEMBL741950 0.81 SMN1; SMN2 (0.66) SMN1; SMN2HTTLMNAALOX15TSHR
SCHEMBL5884818 0.78 TDP1 (0.61) SMN1; SMN2HTTLMNAALOX15TSHR
SCHEMBL3161153 0.78 TDP1 (0.84) SMN1; SMN2HTTLMNAALOX15TSHR
SCHEMBL9814242 0.78 TDP1 (0.84) SMN1; SMN2HTTLMNAALOX15TSHR
SCHEMBL30294105 0.78 TDP1 (0.84) SMN1; SMN2HTTLMNAALOX15TSHR
SCHEMBL4284704 0.78 EGLN3 (0.74) SMN1; SMN2HTTLMNATSHRMAPT
SCHEMBL24177940 0.78 SMN1; SMN2 (0.66) SMN1; SMN2HTTLMNAALOX15TSHR
SCHEMBL3045911 0.78 EGLN3 (0.61) SMN1; SMN2HTTLMNAALOX15TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7141352-B2 Basic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-11-28 US disclosed
US-20050008968-A1 Basic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-01-13 US disclosed