Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 8/20 | 0.66 |
| ▸ | HTT | P42858 | 4/20 | 0.66 |
| ▸ | LMNA | P02545 | 5/20 | 0.63 |
| ▸ | EGLN3 | Q9H6Z9 | 1/20 | 0.60 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.60 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.60 |
| ▸ | GAA | P10253 | 1/20 | 0.55 |
| ▸ | RAB9A | P51151 | 1/20 | 0.55 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.54 |
| ▸ | TSHR | P16473 | 1/20 | 0.54 |
| ▸ | APAF1 | O14727 | 1/20 | 0.52 |
| ▸ | MAPT | P10636 | 2/20 | 0.52 |
| ▸ | STAT3 | P40763 | 1/20 | 0.52 |
| ▸ | LTA4H | P09960 | 1/20 | 0.52 |
| ▸ | POLB | P06746 | 1/20 | 0.52 |
| ▸ | MEN1 | O00255 | 1/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5884672 | 0.92 | SMN1; SMN2 (0.60) | SMN1; SMN2HTTLMNAEGLN3TDP1 | |
| SCHEMBL24177942 | 0.86 | SMN1; SMN2 (0.60) | SMN1; SMN2HTTLMNAEGLN3TDP1 | |
| SCHEMBL24177940 | 0.86 | SMN1; SMN2 (0.66) | SMN1; SMN2HTTLMNAEGLN3TDP1 | |
| SCHEMBL28235209 | 0.85 | EGLN3 (0.55) | SMN1; SMN2HTTLMNAEGLN3TDP1 | |
| SCHEMBL24177950 | 0.85 | SMN1; SMN2 (0.58) | SMN1; SMN2HTTLMNAEGLN3TDP1 | |
| SCHEMBL4791791 | 0.84 | SMN1; SMN2 (0.61) | SMN1; SMN2HTTLMNAEGLN3TDP1 | |
| SCHEMBL501835 | 0.83 | SMN1; SMN2 (0.60) | SMN1; SMN2HTTLMNAEGLN3TDP1 | |
| SCHEMBL75393 | 0.83 | EGLN3 (0.61) | SMN1; SMN2HTTLMNAEGLN3TDP1 | |
| SCHEMBL14961172 | 0.82 | APAF1 (0.56) | SMN1; SMN2HTTLMNAEGLN3TDP1 | |
| SCHEMBL16090997 | 0.81 | SMN1; SMN2 (0.55) | SMN1; SMN2HTTLMNAEGLN3TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 78 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152692-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20220004101-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-01-06 | — | — | US | disclosed |
| EP-2482132-B1 | Resist pattern forming process | SHINETSU CHEMICAL CO (JP) | 2019-10-16 | — | — | EP | disclosed |
| US-9651864-B2 | Negative resist composition, method for producing relief pattern using the same, and electronic component using the same | DAI NIPPON PRINTING CO., LTD. (JP) | 2017-05-16 | — | — | US | disclosed |
| US-9057949-B2 | Patterning process, resist composition, polymer, and polymerizable ester compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-16 | — | — | US | disclosed |
| US-8945809-B2 | Fluorinated monomer, fluorinated polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-03 | — | — | US | disclosed |
| US-8933251-B2 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-01-13 | — | — | US | disclosed |
| US-8609889-B2 | Photoacid generator, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-12-17 | — | — | US | disclosed |
| US-20130231491-A1 | FLUORINATED MONOMER OF CYCLIC ACETAL STRUCTURE, POLYMER, RESIST PROTECTIVE COATING COMPOSITION, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-09-05 | — | — | US | disclosed |
| US-20130157194-A1 | PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND POLYMERIZABLE ESTER COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-20 | — | — | US | disclosed |
| EP-1472319-A1 | NON-TOXIC CORROSION PROTECTION PIGMENTS BASED ON COBALT | UNIVERSITY OF DAYTON (US) | 2004-11-03 | — | — | EP | disclosed |
| WO-2004065305-A1 | NON-TOXIC CORROSION-PROTECTION PIGMENTS BASED ON MANGANESE | UNIVERSITY OF DAYTON (US) | 2004-08-05 | — | — | WO | disclosed |
| US-20040104377-A1 | Non-toxic corrosion-protection pigments based on rare earth elements | UNIVERSITY OF DAYTON | 2004-06-03 | — | — | US | disclosed |
| US-20040020568-A1 | Non-toxic corrosion-protection conversion coats based on rare earth elements | DAYTON, UNIVERSITY OF | 2004-02-05 | — | — | US | disclosed |
| US-20040016910-A1 | Non-toxic corrosion-protection rinses and seals based on rare earth elements | DAYTON, UNIVERSITY OF | 2004-01-29 | — | — | US | disclosed |
| US-20040011252-A1 | Non-toxic corrosion-protection pigments based on manganese | UNIVERSITY OF DAYTON | 2004-01-22 | — | — | US | disclosed |
| US-20030234063-A1 | Non-toxic corrosion-protection conversion coats based on cobalt | DAYTON, UNIVERSITY OF | 2003-12-25 | — | — | US | disclosed |
| US-20030230363-A1 | Non-toxic corrosion-protection rinses and seals based on cobalt | UNIVERSITY OF DAYTON | 2003-12-18 | — | — | US | disclosed |
| WO-2003060191-A2 | NON-TOXIC CORROSION-PROTECTION CONVERSION COATINGES ABSED ON COBALT | UNIVERSITY OF DAYTON (US) | 2003-07-24 | — | — | WO | disclosed |
| WO-2003060019-A1 | NON-TOXIC CORROSION PROTECTION PIGMENTS BASED ON COBALT | UNIVERSITY OF DAYTON (US) | 2003-07-24 | — | — | WO | disclosed |