SCHEMBL5885010

SCHEMBL5885010

CCOC(C)OCCn1cnc2ccccc21

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 10/20 0.60
LMNA P02545 7/20 0.60
L3MBTL1 Q9Y468 1/20 0.57
TDP1 Q9NUW8 1/20 0.57
RAB9A P51151 3/20 0.52
GAA P10253 1/20 0.52
TSHR P16473 2/20 0.51
ALOX15 P16050 1/20 0.51
HTT P42858 5/20 0.50
MAPT P10636 2/20 0.50
STAT3 P40763 1/20 0.50
LTA4H P09960 1/20 0.50
MEN1 O00255 1/20 0.49
KMT2A Q03164 1/20 0.49
NPC1 O15118 2/20 0.48
PKM P14618 1/20 0.48
NFKB1 P19838 1/20 0.48
NFKB2 Q00653 1/20 0.48
RELA Q04206 1/20 0.48
NPSR1 Q6W5P4 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1023806 0.85 SMN1; SMN2 (0.67) SMN1; SMN2LMNAL3MBTL1TDP1RAB9A
SCHEMBL1026457 0.81 SMN1; SMN2 (0.79) SMN1; SMN2LMNAL3MBTL1TDP1RAB9A
SCHEMBL5388791 0.78 SMN1; SMN2 (0.85) SMN1; SMN2LMNAL3MBTL1TDP1RAB9A
SCHEMBL1024585 0.77 SMN1; SMN2 (0.73) SMN1; SMN2LMNAL3MBTL1TDP1RAB9A
SCHEMBL352045 0.77 SMN1; SMN2 (0.96) SMN1; SMN2LMNAL3MBTL1TDP1RAB9A
SCHEMBL5377421 0.77 SMN1; SMN2 (0.82) SMN1; SMN2LMNAL3MBTL1TDP1RAB9A
SCHEMBL29924240 0.76 SMN1; SMN2 (1.00) SMN1; SMN2LMNAL3MBTL1TDP1RAB9A
SCHEMBL351186 0.76 SMN1; SMN2 (1.00) SMN1; SMN2LMNAL3MBTL1TDP1RAB9A
SCHEMBL352367 0.76 SMN1; SMN2 (1.00) SMN1; SMN2LMNAL3MBTL1TDP1RAB9A
SCHEMBL14722865 0.75 TDP1 (0.57) SMN1; SMN2LMNAL3MBTL1TDP1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7141352-B2 Basic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-11-28 US disclosed
US-20050008968-A1 Basic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-01-13 US disclosed