⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL376882 | 0.82 | — | — | |
| Water SCHEMBL376883 | 0.82 | — | — | |
| SCHEMBL29895988 | 0.71 | — | — | |
| SCHEMBL31359158 | 0.71 | — | — | |
| SCHEMBL28844855 | 0.71 | — | — | |
| SCHEMBL30608800 | 0.71 | — | — | |
| Water SCHEMBL28755368 | 0.71 | — | — | |
| SCHEMBL1326034 | 0.71 | — | — | |
| SCHEMBL205124 | 0.71 | — | — | |
| SCHEMBL7027 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 114 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122032543-A | Preparation method of ruthenium strontium titanate catalyst | 浙江省环保集团生态环保研究院有限公司 | 2026-05-15 | — | — | CN | claimed |
| US-12116684-B2 | Methods of forming alloys by reducing metal oxides | BATTELLE ENERGY ALLIANCE, LLC (US) | 2024-10-15 | — | — | US | claimed |
| US-20230282378-A1 | ELECTROCHEMICAL CELLS FOR DIRECT OXIDE REDUCTION, AND RELATED METHODS | UNITED STATES DEPARTMENT OF ENERGY | 2023-09-07 | — | — | US | claimed |
| US-20230046888-A1 | METHODS OF RECOVERING A METAL FROM A METAL-CONTAINING WASTE MATERIAL AND RELATED ELECTROCHEMICAL CELLS | UNITED STATES DEPARTMENT OF ENERGY | 2023-02-16 | — | — | US | claimed |
| CN-110090650-A | Preparation method of cobaltosic oxide catalyst that ruthenium strontium promotes altogether and products thereof and and application | 上海纳米技术及应用国家工程研究中心有限公司 | 2019-08-06 | — | — | CN | claimed |
| US-20190237209-A1 | ELECTROCHEMICAL CELLS FOR DIRECT OXIDE REDUCTION, AND RELATED METHODS | UNITED STATES DEPARTMENT OF ENERGY | 2019-08-01 | — | — | US | claimed |
| US-9576805-B2 | Fortification of charge-storing material in high-K dielectric environments and resulting apparatuses | MICRON TECHNOLOGY, INC. (US) | 2017-02-21 | — | — | US | claimed |
| US-20150200101-A1 | FORTIFICATION OF CHARGE-STORING MATERIAL IN HIGH-K DIELECTRIC ENVIRONMENTS AND RESULTING APPARATUSES | MICRON TECHNOLOGY, INC. | 2015-07-16 | — | — | US | claimed |
| US-20130071670-A1 | METHOD FOR PRODUCING THIN FILM ELECTRODES | UCHICAGO ARGONNE, LLC (US) | 2013-03-21 | — | — | US | claimed |
| US-20130001673-A1 | FORTIFICATION OF CHARGE STORING MATERIAL IN HIGH K DIELECTRIC ENVIRONMENTS AND RESULTING APPARATUSES | MICRON TECHNOLOGY, INC. (US) | 2013-01-03 | — | — | US | claimed |
| US-8288811-B2 | Fortification of charge-storing material in high-K dielectric environments and resulting apparatuses | MICRON TECHNOLOGY, INC. (US) | 2012-10-16 | — | — | US | claimed |
| WO-2011119424-A2 | FORTIFICATION OF CHARGE-STORING MATERIAL IN HIGH-K DIELECTRIC ENVIRONMENTS AND RESULTING APPARATUSES | MICRON TECHNOLOGY, INC. (US) | 2011-09-29 | — | — | WO | claimed |
| US-20110227142-A1 | FORTIFICATION OF CHARGE-STORING MATERIAL IN HIGH-K DIELECTRIC ENVIRONMENTS AND RESULTING APPRATUSES | MICRON TECHNOLOGY, INC. (US) | 2011-09-22 | — | — | US | claimed |
| EP-1511092-B1 | Laminated structure, method of manufacturing the same and ultrasonic transducer array | FUJI PHOTO FILM CO LTD (JP) | 2007-02-21 | — | — | EP | claimed |
| EP-0919383-B1 | Ink jet recording head and ink jet recorder | SEIKO EPSON CORP (JP) | 2005-03-09 | — | — | EP | claimed |
| US-20020164887-A1 | Etching method and etching apparatus, method for manufacturing semiconductor device, and semiconductor device | KABUSHIKI KAISHA TOSHIBA | 2002-11-07 | — | — | US | claimed |
| US-6436723-B1 | OZONE WATER CONTAINING AN OXIDATION AGENT HAVING AN OXIDATION-REDUCTION POTENTIAL OF 2V OR MORE IS SUPPLIED ONTO A METAL COMPOUND FILM SUCH AS SRRUO FILM OR THE LIKE, AND THE METAL COMPOUND FILM IS ETCHED BY OXIDATION-REDUCTION REACTION | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-08-20 | — | — | US | claimed |
| CN-122032543-A | Preparation method of ruthenium strontium titanate catalyst | 浙江省环保集团生态环保研究院有限公司 | 2026-05-15 | — | — | CN | disclosed |
| US-20010043453-A1 | Method of forming metal electrodes | APPLIED MATERIALS, INC. | 2001-11-22 | — | — | US | disclosed |
| EP-1130655-A2 | Method of forming metal electrodes | Applied Materials, Inc. (US) | 2001-09-05 | — | — | EP | disclosed |