SCHEMBL5887372

SCHEMBL5887372

c1cc(C2CCCCC2)ccc1Sc1ccc(C2CCCCC2)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTT P42858 2/20 0.43
LMNA P02545 1/20 0.43
HDAC8 Q9BY41 2/20 0.42
HDAC6 Q9UBN7 2/20 0.42
HDAC1 Q13547 1/20 0.42
KMT2A Q03164 2/20 0.42
TDP1 Q9NUW8 2/20 0.42
NOTUM Q6P988 2/20 0.42
HSP90AA1 P07900 1/20 0.42
GAA P10253 1/20 0.42
MAPT P10636 1/20 0.42
NOS3 P29474 2/20 0.41
NOS1 P29475 2/20 0.41
NOS2 P35228 2/20 0.41
CYP11B2 P19099 1/20 0.41
HAO1 Q9UJM8 1/20 0.41
S1PR1 P21453 1/20 0.40
ESR2 Q92731 1/20 0.39
BCL2L1 Q07817 1/20 0.39
MCL1 Q07820 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2754908 0.92 SLC18A3 (0.46) HTTLMNAKMT2ATDP1CYP11B2
SCHEMBL11588397 0.90 ESR2 (0.55) ESR2
SCHEMBL1093487 0.87 ESR2 (0.44) ESR2HRH3
SCHEMBL944630 0.86 HTT (0.43) HTTLMNAHDAC8HDAC6HDAC1
SCHEMBL18017090 0.85 NOTUM (0.41) HTTLMNAHDAC8HDAC6HDAC1
SCHEMBL28584923 0.84 HDAC8 (0.52) HTTLMNAHDAC8HDAC6HDAC1
SCHEMBL6275125 0.84 HDAC8 (0.52) HTTLMNAHDAC8HDAC6HDAC1
SCHEMBL15260520 0.84 HDAC8 (0.52) HTTLMNAHDAC8HDAC6HDAC1
SCHEMBL42782 0.84 HDAC8 (0.52) HTTLMNAHDAC8HDAC6HDAC1
SCHEMBL10011868 0.84 HTT (0.42) HTTLMNAHDAC8HDAC6HDAC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114591207-B Synthesis method of cycloalkyl aryl thioether compound 台州学院 2024-03-26 CN disclosed
US-20230161255-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-7112697-B1 Methods for formation of aryl-sulfur and aryl-selenium compounds using copper(I) catalysts UNIVERSITY OF MASSACHUSETTS (US) 2006-09-26 US disclosed