SCHEMBL5887469

SCHEMBL5887469

CN(C)C[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1728837 0.82
SCHEMBL12677760 0.75 ALDH1A1 (0.35)
SCHEMBL12927847 0.72
SCHEMBL17945532 0.72
SCHEMBL12884841 0.72
SCHEMBL12927856 0.70
SCHEMBL7471046 0.69
SCHEMBL12296687 0.69
SCHEMBL8364813 0.67 ALDH1A1 (0.30)
SCHEMBL14616530 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025133718-A1 AN EFFICIENT PROCESS FOR THE SYNTHESIS OF PARAXANTHINE FERTIS INDIA PVT. LTD. (IN) 2025-06-26 WO claimed
US-4473662-A AN AMINOALKYLSILANE, AND A TERTIARY AMINE OR ORGANOTIN COMPOUND HITACHI, LTD. (JP) 1984-09-25 US claimed
WO-2025133718-A1 AN EFFICIENT PROCESS FOR THE SYNTHESIS OF PARAXANTHINE FERTIS INDIA PVT. LTD. (IN) 2025-06-26 WO disclosed
US-11732350-B2 Films of desired composition and film properties NOVELLUS SYSTEMS, INC. (US) 2023-08-22 US disclosed
US-11732350-B2 Films of desired composition and film properties NOVELLUS SYSTEMS, INC. (US) 2023-08-22 US disclosed
US-11708634-B2 Films of desired composition and film properties NOVELLUS SYSTEMS, INC. (US) 2023-07-25 US disclosed
US-11680314-B2 Films of desired composition and film properties NOVELLUS SYSTEMS, INC. (US) 2023-06-20 US disclosed
US-11680315-B2 Films of desired composition and film properties NOVELLUS SYSTEMS, INC. (US) 2023-06-20 US disclosed
US-11680315-B2 Films of desired composition and film properties NOVELLUS SYSTEMS, INC. (US) 2023-06-20 US disclosed
US-20220220608-A1 FILMS OF DESIRED COMPOSITION AND FILM PROPERTIES NOVELLUS SYSTEMS INC (US) 2022-07-14 US disclosed
US-20220220611-A1 FILMS OF DESIRED COMPOSITION AND FILM PROPERTIES NOVELLUS SYSTEMS INC (US) 2022-07-14 US disclosed
US-20100297554-A1 RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-25 US disclosed
US-20100297563-A1 RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-25 US disclosed
US-20100159392-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-06-24 US disclosed
US-20090131366-A1 Use of Amine-Borane Compounds as Anti-Microbial Agents HADASIT MEDICAL RESEARCH SERVICES AND DEVELOPMENT LTD. (IL) 2009-05-21 US disclosed
US-20070106045-A1 reaction product of an isocyanate dimer containing uretidine-2,4-dione group, with an epoxy-functional silane and a diamine to form polysiloxane-urea or urethane copolymer with quaternary amine groups and uretdione in the backbone; wash resistant fabric softeners MOMENTIVE PERFORMANCE MATERIALS INC. 2007-05-10 US disclosed
US-7018763-B2 Static latent image developing toner, developer and image forming method KONICA CORPORATION (JP) 2006-03-28 US disclosed
US-20030219667-A1 Static latent image developing toner, developer and image forming method KONICA CORPORATION (JP) 2003-11-27 US disclosed
US-4645837-A GROUP 8 METAL CARBONYL COMPLEX SRI INTERNATIONAL (US) 1987-02-24 US disclosed
US-4473662-A AN AMINOALKYLSILANE, AND A TERTIARY AMINE OR ORGANOTIN COMPOUND HITACHI, LTD. (JP) 1984-09-25 US disclosed