⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrolein SCHEMBL28185839 | 0.86 | ANPEP (0.34) | — | |
| SCHEMBL27084477 | 0.75 | ANPEP (0.38) | — | |
| SCHEMBL28477281 | 0.75 | KDM4E (0.39) | — | |
| SCHEMBL18775381 | 0.73 | KISS1R (0.39) | — | |
| SCHEMBL360350 | 0.73 | — | — | |
| SCHEMBL12570457 | 0.72 | — | — | |
| SCHEMBL1919170 | 0.72 | — | — | |
| SCHEMBL27866353 | 0.71 | ANPEP (0.40) | — | |
| SCHEMBL18377151 | 0.71 | KISS1R (0.37) | — | |
| SCHEMBL170745 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107468584-A | A kind of crease-resistant shine white composition and preparation method thereof and the application in cosmetics | 泾县麦蓝网络技术服务有限公司 | 2017-12-15 | — | — | CN | claimed |
| CN-106674061-A | Method for preparing N-ammonium methyl taurine and N-sodium methyl taurine | 廖立新 | 2017-05-17 | — | — | CN | claimed |
| CN-102283809-B | Prepare the method for nano structured lipid carrier (NLC) and prepared product | MALAYSIAN PALM OIL BOARD MPOB (MY) | 2016-12-14 | — | — | CN | claimed |
| CN-110339080-A | A kind of lip moisturizing essence dew | 广州华狮化妆品科技有限公司 | 2019-10-18 | — | — | CN | disclosed |
| CN-108546444-A | Antibacterial environmentally friendly Ecological putty of one kind and preparation method thereof | 湖南威邦新材料有限公司 | 2018-09-18 | — | — | CN | disclosed |
| CN-107205894-A | Cosmetic composition comprising synthetic phyllosilicates and polyols and/or UV filters | 欧莱雅 | 2017-09-26 | — | — | CN | disclosed |
| CN-106674061-A | Method for preparing N-ammonium methyl taurine and N-sodium methyl taurine | 廖立新 | 2017-05-17 | — | — | CN | disclosed |
| CN-106265256-A | A kind of whitening and skin-protecting emulsion containing Flos Rosae Rugosae quintessence oil | 王乔 | 2017-01-04 | — | — | CN | disclosed |
| CN-106190229-A | A kind of super-viscous oil high-efficient demulsifier and preparation method thereof | 安徽炎胜新材料科技有限公司 | 2016-12-07 | — | — | CN | disclosed |
| CN-102161879-B | Polishing composition and polishing method using the same | FUJIMI INC | 2015-02-25 | — | — | CN | disclosed |
| CN-101275057-B | Metal-polishing liquid and polishing method | FUJI PHOTO FILM CO LTD | 2012-11-21 | — | — | CN | disclosed |
| CN-1243071-C | Metal polishing liquid material, metal polishing liquid, method for producing same, and polishing method using same | HITACHI CHEMICAL CO LTD (JP) | 2006-02-22 | — | — | CN | disclosed |
| US-20050261370-A1 | Process for producing of an aminoalkylsulfonic acid and a method of salt exchange for a salt thereof | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2005-11-24 | — | — | US | disclosed |
| CN-1680511-A | Abrasive liquid for metal and method for polishing | HITACHI CHEMICAL CO LTD (JP) | 2005-10-12 | — | — | CN | disclosed |
| EP-1548002-A1 | PROCESS FOR PRODUCING AMINOALKYLSULFONIC ACID AND METHOD OF SALT EXCHANGE FOR SALT THEREOF | Wako Pure Chemical Industries, Ltd. (JP) | 2005-06-29 | — | — | EP | disclosed |
| CN-1204602-C | Polishing liquid for metal and polishing method | HITACHI CHEMICAL CO LTD (JP) | 2005-06-01 | — | — | CN | disclosed |
| CN-1158694-C | Metal polishing liquid material, metal polishing liquid, method for producing same, and polishing method using same | �������ɹ�ҵ��ʽ���� | 2004-07-21 | — | — | CN | disclosed |
| CN-1392215-A | Metal polishing liquid material, metal polishing liquid, method for producing same, and polishing method using same | HITACHI CHEMICAL CO LTD (JP) | 2003-01-22 | — | — | CN | disclosed |
| CN-1334961-A | Metal polishing liquid material, metal polishing liquid, method for producing same, and polishing method using same | HITACHI CHEMICAL CO LTD (JP) | 2002-02-06 | — | — | CN | disclosed |
| CN-1325540-A | Polishing liquid for metal and polishing method | HITACHI CHEMICAL CO LTD (JP) | 2001-12-05 | — | — | CN | disclosed |