⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6855191 | 0.80 | — | — | |
| SCHEMBL28769594 | 0.77 | ALDH1A1 (0.37) | — | |
| SCHEMBL8406043 | 0.74 | — | — | |
| SCHEMBL428088 | 0.74 | — | — | |
| SCHEMBL9269493 | 0.74 | — | — | |
| SCHEMBL375496 | 0.74 | — | — | |
| SCHEMBL10987856 | 0.72 | — | — | |
| SCHEMBL28442048 | 0.72 | — | — | |
| SCHEMBL11048888 | 0.72 | — | — | |
| SCHEMBL27322424 | 0.70 | HCAR2 (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102753587-A | Fluorine-containing (meth)acrylic (co)polymer and molded body films thereof | KANEKA CORP | 2012-10-24 | — | — | CN | disclosed |
| US-7135595-B2 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-11-14 | — | — | US | disclosed |
| US-20060128914-A1 | photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-06-15 | — | — | US | disclosed |
| US-7014980-B2 | Includes a polymer containing at least one of the following monomers: 1,1,1-trifluoro-2-trifluoromethyl-2-hydroxy-(4 or 5)-pentyl (meth)acrylate or 2-{[5-(1',1',1'-trifluoro-2'-trifluoromethyl-2'-hydroxy)propyl]norbornyl]}(meth)acrylate | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-03-21 | — | — | US | disclosed |
| US-20050019696-A1 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-01-27 | — | — | US | disclosed |
| US-6806026-B2 | POLYMER OF A FLUORINATED HYDROXYALKYL ACRYLATE | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-10-19 | — | — | US | disclosed |
| US-20030224283-A1 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-12-04 | — | — | US | disclosed |
| CN-86106575-A | The fluoropropenes acid mono, by its derived polymers and be used for the processing of the water-repellancy and the grease proofness of different base | — | 1987-04-22 | — | — | CN | disclosed |